Invention Grant
- Patent Title: Analog capacitor and method of manufacturing the same
- Patent Title (中): 模拟电容及其制造方法
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Application No.: US11187489Application Date: 2005-07-22
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Publication No.: US07679124B2Publication Date: 2010-03-16
- Inventor: Yong-kuk Jeong , Seok-jun Won , Dae-jin Kwon , Min-woo Song , Weon-hong Kim
- Applicant: Yong-kuk Jeong , Seok-jun Won , Dae-jin Kwon , Min-woo Song , Weon-hong Kim
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Mills & Onello, LLP
- Priority: KR10-2004-0059357 20040728; KR10-2005-0010090 20050203
- Main IPC: H01L27/108
- IPC: H01L27/108

Abstract:
An analog capacitor capable of reducing the influence of an applied voltage on a capacitance and a method of manufacturing the analog capacitor are provided. The analog capacitor includes a lower electrode which is formed on a substrate, a multi-layered dielectric layer which includes at least one oxide layer and at least one oxynitride layer which are formed of a material selected from the group consisting of Hf, Al, Zr, La, Ba, Sr, Ti, Pb, Bi and a combination thereof and is formed on the lower electrode, and an upper electrode which is formed on the multi-layered dielectric layer.
Public/Granted literature
- US20060022245A1 Analog capacitor and method of manufacturing the same Public/Granted day:2006-02-02
Information query
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