Invention Grant
US07679202B2 Semiconductor device having symbol pattern utilized as identification sign
有权
具有用作识别符号的符号图案的半导体器件
- Patent Title: Semiconductor device having symbol pattern utilized as identification sign
- Patent Title (中): 具有用作识别符号的符号图案的半导体器件
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Application No.: US11790123Application Date: 2007-04-24
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Publication No.: US07679202B2Publication Date: 2010-03-16
- Inventor: Shigeki Yoshida , Fumio Ushida , Nobuhisa Naori , Yasutaka Ozaki
- Applicant: Shigeki Yoshida , Fumio Ushida , Nobuhisa Naori , Yasutaka Ozaki
- Applicant Address: JP Yokohama
- Assignee: Fujitsu Microelectronics Limited
- Current Assignee: Fujitsu Microelectronics Limited
- Current Assignee Address: JP Yokohama
- Agency: Fujitsu Patent Center
- Priority: JP2006-172253 20060622
- Main IPC: H01L23/544
- IPC: H01L23/544 ; H01L21/304 ; H01L21/76

Abstract:
A plurality of device patterns constituting part of an electronic circuit are formed over the surface of a substrate. A symbol pattern to be used for an identification sign is formed in the same layer as the device patterns. A width of the device pattern is within a pattern width range on a design rule. The symbol pattern is formed by a plurality of isolated element patterns. The element pattern is either a linear pattern or a dot pattern. A width of the element pattern is equal to or larger than 0.8 time a lower limit value of the pattern width range and equal to or smaller than 1.2 times an upper limit value of the pattern width range.
Public/Granted literature
- US20070296091A1 Semiconductor device having symbol pattern utilized as indentification sign and its manufacture method Public/Granted day:2007-12-27
Information query
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