发明授权
US07679202B2 Semiconductor device having symbol pattern utilized as identification sign
有权
具有用作识别符号的符号图案的半导体器件
- 专利标题: Semiconductor device having symbol pattern utilized as identification sign
- 专利标题(中): 具有用作识别符号的符号图案的半导体器件
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申请号: US11790123申请日: 2007-04-24
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公开(公告)号: US07679202B2公开(公告)日: 2010-03-16
- 发明人: Shigeki Yoshida , Fumio Ushida , Nobuhisa Naori , Yasutaka Ozaki
- 申请人: Shigeki Yoshida , Fumio Ushida , Nobuhisa Naori , Yasutaka Ozaki
- 申请人地址: JP Yokohama
- 专利权人: Fujitsu Microelectronics Limited
- 当前专利权人: Fujitsu Microelectronics Limited
- 当前专利权人地址: JP Yokohama
- 代理机构: Fujitsu Patent Center
- 优先权: JP2006-172253 20060622
- 主分类号: H01L23/544
- IPC分类号: H01L23/544 ; H01L21/304 ; H01L21/76
摘要:
A plurality of device patterns constituting part of an electronic circuit are formed over the surface of a substrate. A symbol pattern to be used for an identification sign is formed in the same layer as the device patterns. A width of the device pattern is within a pattern width range on a design rule. The symbol pattern is formed by a plurality of isolated element patterns. The element pattern is either a linear pattern or a dot pattern. A width of the element pattern is equal to or larger than 0.8 time a lower limit value of the pattern width range and equal to or smaller than 1.2 times an upper limit value of the pattern width range.
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