发明授权
- 专利标题： Plasma generation apparatus and work processing apparatus
- 专利标题（中）： 等离子体发生装置和作业处理装置
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申请号： US11703038申请日： 2007-02-06
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公开(公告)号： US07682482B2公开(公告)日： 2010-03-23
- 发明人: Kazuhiro Yoshida , Ryuichi Iwasaki , Hirofumi Mankawa
- 申请人： Kazuhiro Yoshida , Ryuichi Iwasaki , Hirofumi Mankawa
- 申请人地址： JP Wakayama
- 专利权人： Noritsu Koki Co., Ltd.
- 当前专利权人： Noritsu Koki Co., Ltd.
- 当前专利权人地址： JP Wakayama
- 代理机构： Jordan and Hamburg LLP
- 优先权： JP2006-042197 20060220
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; C23F1/00 ; H01L21/306
摘要：
A plasma generation apparatus is provided which includes: an apparatus main body which has a microwave generation section which generates a microwave and a plasma generation nozzle which generates and emits a plasma gas based on the energy of the microwave; a microwave detection unit which detects a microwave leaking from the apparatus main body; and a control section which stops the microwave generation section from generating a microwave if the detection unit detects a microwave.
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