Plasma generation apparatus and work processing apparatus
    1.
    发明申请
    Plasma generation apparatus and work processing apparatus 失效
    等离子体发生装置和作业处理装置

    公开(公告)号:US20070193516A1

    公开(公告)日:2007-08-23

    申请号:US11703038

    申请日:2007-02-06

    IPC分类号: C23F1/00 C23C16/00

    摘要: A plasma generation apparatus is provided which includes: an apparatus main body which has a microwave generation section which generates a microwave and a plasma generation nozzle which generates and emits a plasma gas based on the energy of the microwave; a microwave detection unit which detects a microwave leaking from the apparatus main body; and a control section which stops the microwave generation section from generating a microwave if the detection unit detects a microwave.

    摘要翻译: 提供了一种等离子体产生装置,其包括:具有产生微波的微波产生部分和基于微波能量产生和发射等离子体气体的等离子体产生喷嘴的装置主体; 微波检测单元,其检测从设备主体泄漏的微波; 以及控制部分,如果检测单元检测到微波,则停止微波产生部分产生微波。

    Plasma generation apparatus and work processing apparatus
    2.
    发明授权
    Plasma generation apparatus and work processing apparatus 失效
    等离子体发生装置和作业处理装置

    公开(公告)号:US07682482B2

    公开(公告)日:2010-03-23

    申请号:US11703038

    申请日:2007-02-06

    IPC分类号: C23C16/00 C23F1/00 H01L21/306

    摘要: A plasma generation apparatus is provided which includes: an apparatus main body which has a microwave generation section which generates a microwave and a plasma generation nozzle which generates and emits a plasma gas based on the energy of the microwave; a microwave detection unit which detects a microwave leaking from the apparatus main body; and a control section which stops the microwave generation section from generating a microwave if the detection unit detects a microwave.

    摘要翻译: 提供了一种等离子体产生装置,其包括:具有产生微波的微波产生部分和基于微波能量产生和发射等离子体气体的等离子体产生喷嘴的装置主体; 微波检测单元,其检测从设备主体泄漏的微波; 以及控制部分,如果检测单元检测到微波,则停止微波产生部分产生微波。

    Plasma generation apparatus and workpiece processing apparatus using the same
    3.
    发明申请
    Plasma generation apparatus and workpiece processing apparatus using the same 审中-公开
    等离子体发生装置和使用其的工件处理装置

    公开(公告)号:US20080053988A1

    公开(公告)日:2008-03-06

    申请号:US11895706

    申请日:2007-08-27

    IPC分类号: H05B6/68

    摘要: Disclosed is a plasma generation apparatus, which comprises a microwave generation section adapted to generate a microwave, a gas supply section adapted to supply a gas to be plasmatized, a plasma generation nozzle which is provided with an inner electrode adapted to receive the microwave and an outer electrode concentrically disposed outside the inner electrode, and adapted to plasmatize the gas supplied from the gas supply section thereinto, based on energy of the microwave, and emit the plasmatized gas from a distal end thereof; and an adapter attached to the distal end of the plasma generation nozzle. In the plasma generation apparatus, the inner and outer electrodes of the plasma generation nozzle are disposed to allow a glow discharge to be induced therebetween so as to plasmatize the gas in a space defined therebetween, and, according to a new supply of the gas into the space, emit the plasmatized gas under atmospheric pressures from a ring-shaped spout of the space in the distal end of the plasma generation nozzle. The adapter is adapted to convert the ring-shaped spout to a lengthwise spout thereof.

    摘要翻译: 公开了一种等离子体产生装置,其包括适于产生微波的微波产生部分,适于供应待等离子体化气体的气体供应部分,具有适于接收微波的内部电极的等离子体产生喷嘴和 外部电极同心地设置在内部电极的外部,并且适于基于微波的能量等离子体化从气体供应部分供应的气体,并从其远端发射等离子体化气体; 以及连接到等离子体产生喷嘴的远端的适配器。 在等离子体产生装置中,等离子体产生喷嘴的内电极和外电极被设置成允许在它们之间引起辉光放电,以便在其间限定的空间中等离子体化气体,并且根据新的气体供应 该空间在大气压下从等离子体生成喷嘴的远端的空间的环状喷口排出等离子体化气体。 适配器适于将环形喷嘴转换成其纵向喷口。

    Workpiece processing apparatus
    4.
    发明申请
    Workpiece processing apparatus 审中-公开
    工件加工装置

    公开(公告)号:US20080289577A1

    公开(公告)日:2008-11-27

    申请号:US12152039

    申请日:2008-05-12

    IPC分类号: C23C16/00

    CPC分类号: H01L21/67069

    摘要: A workpiece processing apparatus S, which comprises: a plasma generator unit 6 including a plasma generation section 18 operable to plasmatize a given gas supplied thereto, and emit the plasmatized gas therefrom; and a transport mechanism 2 adapted to support a target workpiece W in a position beneath the plasma generation section 18, wherein the plasmatized gas is emitted onto the workpiece W to carry out a given processing. The workpiece processing apparatus S further includes a setup frame 4 adapted to set up the plasma generator unit 6 to allow the plasma generation section 18 to be located over the workpiece. The plasma generator unit 6 is mounted to the setup frame 4 in a manner capable of being drawn out of a setup position where the plasma generation section 18 is positioned over the workpiece W, in a horizontal direction.

    摘要翻译: 工件处理装置S,其包括:等离子体发生器单元6,其包括等离子体产生部分18,其可操作以等离子体化供给的给定气体,并从其中排出等离子体化气体; 以及适于将目标工件W支撑在等离子体产生部18下方的输送机构2,其中等离子体化气体被发射到工件W上以进行给定的处理。 工件处理装置S还包括适于建立等离子体发生器单元6以允许等离子体产生部分18位于工件上方的安装框架4。 等离子体发生器单元6以能够从等离子体产生部分18在水平方向上位于工件W上方的设置位置被拉出的方式安装到安装框架4上。

    Plasma generator and work processing apparatus provided with the same
    7.
    发明申请
    Plasma generator and work processing apparatus provided with the same 有权
    等离子发生器和工作处理装置相同

    公开(公告)号:US20090200910A1

    公开(公告)日:2009-08-13

    申请号:US12310896

    申请日:2007-09-12

    IPC分类号: H05H1/24

    摘要: A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.

    摘要翻译: 提供了一种等离子体发生器,其包括:产生微波的微波产生部分; 用于传播微波的波导; 多个等离子体产生喷嘴,其沿着微波传播的方向彼此分离地附接到波导,接收微波,并且基于该微波的能量产生并发射等离子体气体; 以及对应于等离子体产生喷嘴的一部分或全部部分的多个刺针,并且分别设置在波导管中,以便在微波传播方向上彼此隔开预定距离的后方位置 。

    Single piston-cylinder duo-servo drum brake
    9.
    发明授权
    Single piston-cylinder duo-servo drum brake 失效
    单活塞缸双伺服鼓式制动器

    公开(公告)号:US4303148A

    公开(公告)日:1981-12-01

    申请号:US93872

    申请日:1979-11-13

    申请人: Ryuichi Iwasaki

    发明人: Ryuichi Iwasaki

    IPC分类号: F16D51/18 F16D51/52 F16D51/00

    CPC分类号: F16D51/52

    摘要: In a drum brake, a wheel cylinder is located between a pair of adjacent shoe ends for a pair of brake shoes and a piston inserted into the wheel cylinder is slidably engaged through an anchor provided on a backing plate and further the piston is provided with a flange on the side thereof pressing a brake shoe so that the anchor is interposed between the flange of the piston and the wheel cylinder, and, furthermore, a strut is located between the other pair of adjacent shoe ends for the pair of the brake shoes in order to lighten a weight of the brake and facilitate a disassembly and assembly of the brake.

    摘要翻译: 在鼓式制动器中,轮缸位于用于一对制动蹄的一对相邻的鞋楦端之间,并且插入到轮缸中的活塞通过设置在背板上的锚定件可滑动地接合,并且还提供有活塞 法兰在其一侧上按压制动瓦,使得锚固件插入在活塞的凸缘和轮缸之间,此外,支柱位于用于一对制动蹄的另一对相邻的鞋楦之间 以减轻制动器的重量,并便于拆卸和组装制动器。

    STERILIZATION SYSTEM AND GAS FILLING METHOD
    10.
    发明申请
    STERILIZATION SYSTEM AND GAS FILLING METHOD 有权
    灭菌系统和气体填充方法

    公开(公告)号:US20140119989A1

    公开(公告)日:2014-05-01

    申请号:US14127351

    申请日:2012-06-20

    IPC分类号: A61L2/26 A61L2/20

    摘要: The sterilization system includes a plurality of spaces to be sterilized by a sterilization process; a gas supply source generating nitrogen dioxide gas; a piping system and a valve device; a nitrogen dioxide gas sensor; and a control device. The control device performs a gas filling process in which each of the plurality of spaces to be sterilized is connected to the gas supply source one by one for a first predetermined length of time and successively filled with the nitrogen dioxide gas by controlling the valve device, and when the concentration of the nitrogen dioxide gas in a space to be sterilized that is being filled with gas is detected by the sensor to have reached a predetermined level, the control device performs control such that the subsequent gas filling process is performed with this space to be sterilized being excluded from the gas filling process.

    摘要翻译: 灭菌系统包括通过灭菌过程灭菌的多个空间; 产生二氧化氮气体的气体供应源; 管道系统和阀门装置; 二氧化氮气体传感器; 和控制装置。 控制装置进行气体填充处理,其中要消毒的多个空间中的每一个通过控制阀装置一个接一个地连续供给气体供给源,并且连续填充二氧化氮气体, 并且当通过传感器检测待填充气体的被灭菌空间中的二氧化氮气体的浓度达到预定水平时,控制装置进行控制,使得随后的气体填充处理以该空间进行 被排除在气体填充过程之外。