Invention Grant
- Patent Title: Sensor for ion implanter
- Patent Title (中): 离子注入机传感器
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Application No.: US11548295Application Date: 2006-10-11
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Publication No.: US07683348B2Publication Date: 2010-03-23
- Inventor: W Davis Lee , Neil K Colvin
- Applicant: W Davis Lee , Neil K Colvin
- Applicant Address: US MA Beverly
- Assignee: Axcelis Technologies, Inc.
- Current Assignee: Axcelis Technologies, Inc.
- Current Assignee Address: US MA Beverly
- Agency: Tarolli, Sundheim, Covell & Tummino LLP
- Main IPC: G21K5/10
- IPC: G21K5/10

Abstract:
A Faraday cup structure for use with a processing tool. The cup structure has a conductive strike plate coupled to a circuit for monitoring ions striking the strike plate to obtain an indication of the ion beam current. The electrically conductive strike plate is fronted by a mask for dividing an ion beam intercepting cross section into regions or segments. The mask including walls extending to the strike plate for impeding ions reaching the sensor and particles dislodged from the sensor from entering into the evacuated region of the processing tool.
Public/Granted literature
- US20080087846A1 Sensor for Ion Implanter Public/Granted day:2008-04-17
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