公开(公告)号：US09805912B2

公开(公告)日：2017-10-31

申请号：US12948369

申请日：2010-11-17

Applicant: Neil K. Colvin ,  Tseh-Jen Hsieh

Inventor： Neil K. Colvin ,  Tseh-Jen Hsieh

IPC: H01J37/317 ,  H01J47/08 ,  H01J27/02 ,  H01J37/08

CPC classification number: H01J37/3171 ,  H01J27/022 ,  H01J37/08 ,  H01J2237/006 ,  H01J2237/08

Abstract: A system, apparatus and method for increasing ion source lifetime in an ion implanter are provided. Oxidation of the ion source and ion source chamber poisoning resulting from a carbon and oxygen-containing source gas is controlled by utilizing a hydrogen co-gas, which reacts with free oxygen atoms to form hydroxide and water.

公开(公告)号：US08604418B2

公开(公告)日：2013-12-10

申请号：US12755081

申请日：2010-04-06

Applicant: Neil K. Colvin ,  Jincheng Zhang

Inventor： Neil K. Colvin ,  Jincheng Zhang

IPC: B01D59/44

CPC classification number: H01J37/04 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756

Abstract: A method is provided for reducing particle contamination in an ion implantation system, wherein an ion implantation system having source, mass analyzer, resolving aperture, decel suppression plate, and end station is provided. An ion beam is formed via the ion source, and a workpiece is transferred between an external environment and the end station for ion implantation thereto. A decel suppression voltage applied to the decel suppression plate is modulated concurrent with the workpiece transfer, therein causing the ion beam to expand and contract, wherein one or more surfaces of the resolving aperture and/or one or more components downstream of the resolving aperture are impacted by the ion beam, therein mitigating subsequent contamination of workpieces from previously deposited material residing on the one or more surfaces. The contamination can be mitigated by removing the previously deposited material or strongly adhering the previously deposited material to the one or more surfaces.

Abstract translation: 提供了一种用于减少离子注入系统中的颗粒污染的方法，其中提供了具有源，质量分析器，分辨孔径，减速抑制板和终端站的离子注入系统。 通过离子源形成离子束，并且在外部环境和终端站之间传送工件以进行离子注入。 施加到减速抑制板的减速抑制电压与工件传送同时被调制，在其中使得离子束膨胀和收缩，其中分辨孔径的一个或多个表面和/或分辨孔径下游的一个或多个部件是 受到离子束的影响，其中减轻随后从驻留在一个或多个表面上的先前沉积的材料污染工件。 可以通过去除先前沉积的材料或将先前沉积的材料强烈粘附到一个或多个表面来减轻污染。

公开(公告)号：US20110012033A1

公开(公告)日：2011-01-20

申请号：US12835138

申请日：2010-07-13

Applicant: Neil K. Colvin

Inventor： Neil K. Colvin

IPC: H01J37/317 ,  H01J37/02

CPC classification number: H01J37/3171 ,  H01J3/40 ,  H01J37/026 ,  H01J37/09 ,  H01J2237/0041 ,  H01J2237/022 ,  H01J2237/31705

Abstract: An apparatus is provided for reducing particle contamination in an ion implantation system. The apparatus has an enclosure having an entrance, an exit, and at least one louvered side having a plurality of louvers defined therein. A beamline of the ion implantation system passes through the entrance and exit, wherein the plurality of louvers of the at least one louvered side are configured to mechanically filter an edge of an ion beam traveling along the beamline. The enclosure can have two louvered sides and a louvered top, wherein respective widths of the entrance and exit of the enclosure, when measured perpendicular to the beamline, are generally defined by a position of the two louvered sides with respect to one another. One or more of the louvered sides can be adjustably mounted, wherein the width of one or more of the entrance and exit of the enclosure is controllable.

Abstract translation: 提供了用于减少离子注入系统中的颗粒污染的装置。 该装置具有外壳，其具有入口，出口和至少一个百叶窗，其中限定有多个百叶窗。 离子注入系统的束线通过入口和出口，其中至少一个百叶窗侧的多个百叶窗被配置为机械地过滤沿着束线行进的离子束的边缘。 外壳可以具有两个百叶窗和百叶窗顶部，其中当垂直于束线测量时，外壳的入口和出口的相应宽度通常由两个百叶窗相对于彼此的位置来限定。 一个或多个百叶窗侧面可以可调节地安装，其中外壳的入口和出口中的一个或多个的宽度是可控的。

公开(公告)号：US20080230713A1

公开(公告)日：2008-09-25

申请号：US11689769

申请日：2007-03-22

Applicant: Yongzhang Huang ,  Neil K. Colvin ,  Kevin J. Hoyt

Inventor： Yongzhang Huang ,  Neil K. Colvin ,  Kevin J. Hoyt

IPC: H01J27/02

CPC classification number: H01J27/08 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0262 ,  H01J2237/061 ,  H01J2237/082 ,  H01J2237/166

Abstract: An exemplary ion source for creating a stream of ions has a chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. A seals has a ceramic body having an outer wall that abuts the arc chamber body along a circumferential outer lip. The seal also has one or more radially inner channels bounded by one or more inner walls spaced inwardly from the outer wall.

Abstract translation: 用于产生离子流的示例性离子源具有至少部分地界定电弧室的电离区域的室主体。 电弧室主体与热丝电弧室壳体一起使用，其直接或间接地将阴极加热至足够的温度，以使电子流过电弧室的电离区域。 密封件具有陶瓷体，该陶瓷体具有沿着周向外唇缘邻接电弧室主体的外壁。 密封件还具有一个或多个径向内部通道，其由与外壁间隔开的一个或多个内壁限定。

公开(公告)号：US20080087846A1

公开(公告)日：2008-04-17

申请号：US11548295

申请日：2006-10-11

Applicant: W. Davis Lee ,  Neil K. Colvin

Inventor： W. Davis Lee ,  Neil K. Colvin

IPC: H01J37/08

CPC classification number: H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/24507 ,  H01J2237/24535 ,  H01J2237/31703 ,  H01J2237/31705

Abstract: A Faraday cup structure for use with a processing tool. The cup structure has a conductive strike plate coupled to a circuit for monitoring ions striking the strike plate to obtain an indication of the ion beam current. The electrically conductive strike plate is fronted by a mask for dividing an ion beam intercepting cross section into regions or segments. The mask including walls extending to the strike plate for impeding ions reaching the sensor and particles dislodged from the sensor from entering into the evacuated region of the processing tool.

Abstract translation: 法拉第杯结构，用于加工工具。 杯结构具有连接到电路的导电冲击板，用于监测撞击撞击板的离子以获得离子束电流的指示。 导电冲击板由用于将离子束截断截面分成区域或区段的掩模前面。 掩模包括延伸到冲击板的壁，用于阻止到达传感器的离子和从传感器移出的颗粒进入加工工具的抽空区域。

公开(公告)号：US20130140473A1

公开(公告)日：2013-06-06

申请号：US13308795

申请日：2011-12-01

Applicant: Neil K. Colvin ,  Tseh-Jen Hsieh

Inventor： Neil K. Colvin ,  Tseh-Jen Hsieh

IPC: G21K5/00

CPC classification number: H01J37/3171 ,  H01J27/022 ,  H01J37/08 ,  H01J2237/006 ,  H01J2237/022

Abstract: An ion implantation system for improving performance and extending lifetime of an ion source is disclosed whereby the selection, delivery, optimization and control of the flow rate of a co-gas into an ion source chamber is automatically controlled.

Abstract translation: 公开了一种离子注入系统，用于提高离子源的性能和延长使用寿命，从而自动控制对气体进入离子源室的流量的选择，输送，优化和控制。

公开(公告)号：US20110240889A1

公开(公告)日：2011-10-06

申请号：US12755081

申请日：2010-04-06

Applicant: Neil K. Colvin ,  Jincheng Zhang

Inventor： Neil K. Colvin ,  Jincheng Zhang

IPC: H01J37/317

CPC classification number: H01J37/04 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756

Abstract: A method is provided for reducing particle contamination in an ion implantation system, wherein an ion implantation system having source, mass analyzer, resolving aperture, decel suppression plate, and end station is provided. An ion beam is formed via the ion source, and a workpiece is transferred between an external environment and the end station for ion implantation thereto. A decel suppression voltage applied to the decel suppression plate is modulated concurrent with the workpiece transfer, therein causing the ion beam to expand and contract, wherein one or more surfaces of the resolving aperture and/or one or more components downstream of the resolving aperture are impacted by the ion beam, therein mitigating subsequent contamination of workpieces from previously deposited material residing on the one or more surfaces. The contamination can be mitigated by removing the previously deposited material or strongly adhering the previously deposited material to the one or more surfaces.

Abstract translation: 提供了一种用于减少离子注入系统中的颗粒污染的方法，其中提供了具有源，质量分析器，分辨孔径，减速抑制板和终端站的离子注入系统。 通过离子源形成离子束，并且在外部环境和终端站之间传送工件以进行离子注入。 施加到减速抑制板的减速抑制电压与工件传送同时被调制，在其中使得离子束膨胀和收缩，其中分辨孔径的一个或多个表面和/或分辨孔径下游的一个或多个部件是 受到离子束的影响，其中减轻随后从驻留在一个或多个表面上的先前沉积的材料污染工件。 可以通过去除先前沉积的材料或将先前沉积的材料强烈粘附到一个或多个表面来减轻污染。

公开(公告)号：US20140319994A1

公开(公告)日：2014-10-30

申请号：US13870425

申请日：2013-04-25

Applicant: Neil K. Colvin ,  Tseh Jen Hsieh

Inventor： Neil K. Colvin ,  Tseh Jen Hsieh

IPC: H01J37/317 ,  F16J15/02 ,  H01J37/30

CPC classification number: H01J37/3171 ,  F16J15/02 ,  H01J5/26 ,  H01J5/32 ,  H01J27/08 ,  H01J37/08 ,  H01J37/3002

Abstract: An exemplary ion source for creating a stream of ions has a chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. Electrically insulating seal element(s) engaging an outer surface of the arc chamber body are provided for impeding material from exiting the chamber interior openings of the arc chamber body. The seal element(s) have a ceramic body that includes an outer wall that abuts the arc chamber body along a circumferential outer lip. The seal also has one or more radially inner channels bounded by one or more inner walls spaced inwardly from the outer wall. The electrically insulating seal element comprises a Boron Nitride (BN) material.

Abstract translation: 用于产生离子流的示例性离子源具有至少部分地界定电弧室的电离区域的室主体。 电弧室主体与热丝电弧室壳体一起使用，其直接或间接地将阴极加热至足够的温度，以使电子流过电弧室的电离区域。 设置与电弧室主体的外表面接合的绝缘密封元件用于阻止材料离开电弧室主体的室内部开口。 密封元件具有陶瓷体，该陶瓷体包括沿着圆周外唇缘邻接电弧室主体的外壁。 密封件还具有一个或多个径向内部通道，其由与外壁间隔开的一个或多个内壁限定。 电绝缘密封元件包括氮化硼（BN）材料。

公开(公告)号：US08242469B2

公开(公告)日：2012-08-14

申请号：US12835138

申请日：2010-07-13

Applicant: Neil K. Colvin

Inventor： Neil K. Colvin

IPC: H01J37/317 ,  H01J37/02

CPC classification number: H01J37/3171 ,  H01J3/40 ,  H01J37/026 ,  H01J37/09 ,  H01J2237/0041 ,  H01J2237/022 ,  H01J2237/31705

Abstract: An apparatus is provided for reducing particle contamination in an ion implantation system. The apparatus has an enclosure having an entrance, an exit, and at least one louvered side having a plurality of louvers defined therein. A beamline of the ion implantation system passes through the entrance and exit, wherein the plurality of louvers of the at least one louvered side are configured to mechanically filter an edge of an ion beam traveling along the beamline. The enclosure can have two louvered sides and a louvered top, wherein respective widths of the entrance and exit of the enclosure, when measured perpendicular to the beamline, are generally defined by a position of the two louvered sides with respect to one another. One or more of the louvered sides can be adjustably mounted, wherein the width of one or more of the entrance and exit of the enclosure is controllable.

Abstract translation: 提供了用于减少离子注入系统中的颗粒污染的装置。 该装置具有外壳，其具有入口，出口和至少一个百叶窗，其中限定有多个百叶窗。 离子注入系统的束线通过入口和出口，其中至少一个百叶窗侧的多个百叶窗被配置为机械地过滤沿着束线行进的离子束的边缘。 外壳可以具有两个百叶窗和百叶窗顶部，其中当垂直于束线测量时，外壳的入口和出口的相应宽度通常由两个百叶窗相对于彼此的位置来限定。 一个或多个百叶窗侧面可以可调节地安装，其中外壳的入口和出口中的一个或多个的宽度是可控的。

公开(公告)号：US07683348B2

公开(公告)日：2010-03-23

申请号：US11548295

申请日：2006-10-11

Applicant: W Davis Lee ,  Neil K Colvin

Inventor： W Davis Lee ,  Neil K Colvin

IPC: G21K5/10

CPC classification number: H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/24507 ,  H01J2237/24535 ,  H01J2237/31703 ,  H01J2237/31705

Abstract: A Faraday cup structure for use with a processing tool. The cup structure has a conductive strike plate coupled to a circuit for monitoring ions striking the strike plate to obtain an indication of the ion beam current. The electrically conductive strike plate is fronted by a mask for dividing an ion beam intercepting cross section into regions or segments. The mask including walls extending to the strike plate for impeding ions reaching the sensor and particles dislodged from the sensor from entering into the evacuated region of the processing tool.

Abstract translation: 法拉第杯结构，用于加工工具。 杯结构具有连接到电路的导电冲击板，用于监测撞击撞击板的离子以获得离子束电流的指示。 导电冲击板由用于将离子束截断截面分成区域或区段的掩模前面。 掩模包括延伸到冲击板的壁，用于阻止到达传感器的离子和从传感器移出的颗粒进入加工工具的抽空区域。