发明授权
US07684012B2 Lithographic device, device manufacturing method and device manufactured thereby
有权
平版印刷装置，装置制造方法和由此制造的装置
- 专利标题： Lithographic device, device manufacturing method and device manufactured thereby
- 专利标题（中）： 平版印刷装置，装置制造方法和由此制造的装置
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申请号： US11391731申请日： 2006-03-29
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公开(公告)号： US07684012B2公开(公告)日： 2010-03-23
- 发明人: Johannes Henricus Wilhelmus Jacobs , Vadim Yevgenyevich Banine , Barrie Dudley Brewster , Vladimir Vitalevitch Ivanov , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Robert Gordon Livesey , Bastiaan Theodoor Wolschrijn
- 申请人： Johannes Henricus Wilhelmus Jacobs , Vadim Yevgenyevich Banine , Barrie Dudley Brewster , Vladimir Vitalevitch Ivanov , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Robert Gordon Livesey , Bastiaan Theodoor Wolschrijn
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42
摘要：
A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
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