发明授权
- 专利标题： Visual inspection apparatus, visual inspection method, and peripheral edge inspection unit that can be mounted on visual inspection apparatus
- 专利标题（中）： 目视检查装置，目视检查方法和外围检查装置，可以安装在目视检查装置上
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申请号： US11977880申请日： 2007-10-26
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公开(公告)号： US07684031B2公开(公告)日： 2010-03-23
- 发明人: Atsutoshi Yokota , Hiroyasu Hebiishi , Shinichi Dosaka
- 申请人： Atsutoshi Yokota , Hiroyasu Hebiishi , Shinichi Dosaka
- 申请人地址： JP Tokyo
- 专利权人： Olympus Corporation
- 当前专利权人： Olympus Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Frishauf, Holtz, Goodman & Chick, P.C.
- 主分类号： G01N21/00
- IPC分类号： G01N21/00
摘要：
This visual inspection apparatus has a macro-inspection section and a micro-inspection section. In the micro-inspection section, a inspection stage and a microscope are loaded into a loading plate. The inspection stage can be moved in any directions of the X, Y, and Z directions, and can also be rotated in the θ direction. Moreover, a peripheral edge inspection section that acquires an enlarged image of a peripheral edge of wafer W is fixed to the loading plate. The peripheral edge inspection section is arranged so as to image the peripheral edge of wafer W held by the inspection stage.
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