Invention Grant
US07686991B2 Method of aligning a die and stamping a substrate for nano-imprint lithography
失效
对准模具并冲压衬底以进行纳米压印光刻的方法
- Patent Title: Method of aligning a die and stamping a substrate for nano-imprint lithography
- Patent Title (中): 对准模具并冲压衬底以进行纳米压印光刻的方法
-
Application No.: US11788062Application Date: 2007-04-18
-
Publication No.: US07686991B2Publication Date: 2010-03-30
- Inventor: Bruce M. Harper
- Applicant: Bruce M. Harper
- Applicant Address: US CA San Jose
- Assignee: WD Media, Inc.
- Current Assignee: WD Media, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: B29C43/02
- IPC: B29C43/02 ; B29C45/02 ; B29C45/66 ; B29C45/76
Abstract:
A method of aligning die and stamping substrate for nano-imprint lithography is described. The method includes aligning the die by linearly displacing the die along a first axis using a first flexure member and pressing the die along a second axis substantially perpendicular to the first axis while maintaining coupling of the die with the first flexure member.
Public/Granted literature
- US20070194473A1 Press die alignment Public/Granted day:2007-08-23
Information query
