摘要:
Systems for recycling slurry materials during polishing processes are provided. One system includes a polisher having an inlet and drain outlet, and a slurry storage tank to supply a slurry including a preselected material to the polisher inlet, and a recycling assembly including a cross flow filter including an inlet to receive a waste slurry including the preselected material from the polisher drain outlet, where the cross flow filter is configured to concentrate the preselected material in an outlet slurry, a density meter configured to measure a concentration of the preselected material in the filter outlet slurry, a valve coupled to the filter outlet and configured to supply the slurry storage tank, and a controller coupled to the density meter and valve, where the controller is configured to open the valve when the concentration of the preselected material reaches a first concentration threshold.
摘要:
A vortex reducing apparatus and method for drainage of a process tank are described. The vortex reducer including a keel having a longitudinal axis, a top flow foil coupled to the keel and a bottom flow foil coupled to the keel. The top flow foil and the bottom flow foil are each coupled to the keel at a first angle with respect to the longitudinal axis.
摘要:
Method of incorporating atomic oxygen into a magnetic recording layer by sputtering a target containing an oxide of cobalt. The oxide of cobalt may be sputtered to provide a readily dissociable source of oxygen which may increase the concentration of free cobalt atoms (Co) in the magnetic recording layer and also increase oxide content in the magnetic recording layer.
摘要:
A wide area track erasure (WATER) rate of change is determined from a model generated from a plurality of track erasure measurements performed on a magnetic recording media. A model of the change in noise amplitude for an off-track position as a function of the number of aggressor track writes employed in the track erasure measurements is generated. In a log-linear space a linear fit of the change in noise amplitude with respect to the number of aggressor track writes yields a rate of noise amplitude change (dB/decade) which may be utilized to rank magnetic recording media.
摘要:
An imprint embossing alignment system. In one embodiment, the system includes a die having a bottom surface, an embossing foil positioned above the bottom surface, and a mandrel, to receive the substrate, having a rod portion that extends through a central portion of the die. The system also includes a ball bushing positioned around the rod portion and a ring portion positioned between the ball bushing and the embossing foil to hold a precise alignment of a centerline of the rod portion and a centerline of the embossing foil.
摘要:
Drying of wet workpiece, such as a magnetic recording media, following a wet clean process where the wet workpiece is displaced from a liquid volume into a gaseous volume at a pull speed that is dependent on the temperature of the gaseous volume.
摘要:
A disk carrier for teaching disk positioning in a substrate changing system. The disk carrier composed of a panel having a disk opening configured to receive a disk and a plurality of beam sensors disposed around the disk opening to project beams parallel to a surface of the disk when secured within the disk opening. The plurality of beam sensors may be composed of at least one beam sensor on each of a front side and rear side of the panel.
摘要:
A method for forming a glass substrate comprises the steps of forming a glass blank with opposing substantially planar surfaces and at least one edge, coating the glass blank in silica-alumina nanoparticles, the silica-alumina nanoparticles comprising an inner core of silica with an outer shell of alumina, annealing the coated glass blank to form a conformal coating of silica-alumina around the glass blank, and polishing the coated glass blank to remove the conformal coating of silica-alumina from the opposing substantially planar surfaces thereof.
摘要:
A method for applying a strike voltage to one or more substrates during plating. During this method, the substrates are moved in a planetary manner while being held at their exterior edges by a set of parallel mandrels. (The substrates are held in a mutually parallel orientation, typically vertically, during plating.) A voltage is applied to the substrates via a contact pin, a contact plate, a set of ball bearings, a rack end-plate, and the mandrels.
摘要:
A method for aligning a disk with an imprinting surface is described. In one embodiment, the method includes passively aligning an imprinting surface with the disk and imprinting the disk with the imprinting surface. A first air-bearing mandrel freely guides a first centerline of the disk into coincident alignment with a second centerline of the imprinting surface.