发明授权
- 专利标题： Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
- 专利标题（中）： 电子束曝光或系统检查或测量装置及其方法和高度检测装置
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申请号： US11925142申请日： 2007-10-26
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公开(公告)号： US07692144B2公开(公告)日： 2010-04-06
- 发明人: Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
- 申请人： Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
- 申请人地址： JP
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JP
- 代理机构： Antonelli, Terry, Stout & Kraus, LLP.
- 优先权： JP9-216604 19970811
- 主分类号： G01N23/00
- IPC分类号： G01N23/00 ; G21K7/00
摘要：
A method and apparatus for assessing a height of a specimen includes an electron beam unit having an electron beam source, lenses, a table for setting a specimen and controllable in a height direction, and a detector, and a height detection system for detecting height of the specimen set on the table while the specimen is irradiated by an electron beam. The height detection system further includes an illumination system, a collection system, first and second detectors, a device configured to receive output signals from the first and second detectors while the specimen is irradiated by the electron beam and to generate a comparison signal from the output signals, wherein the comparison signal is responsive to the height of the specimen.