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1.发明申请Electron Beam Exposure or System Inspection Or Measurement Apparatus And Its Method And Height Detection Apparatus 有权电子束曝光或系统检测或测量装置及其方法和高度检测装置公开(公告)号：US20080078933A1
公开(公告)日：2008-04-03
申请号：US11925142
申请日：2007-10-26
IPC分类号： G21K5/04
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： A method and apparatus for assessing a height of a specimen includes an electron beam unit having an electron beam source, lenses, a table for setting a specimen and controllable in a height direction, and a detector, and a height detection system for detecting height of the specimen set on the table while the specimen is irradiated by an electron beam. The height detection system further includes an illumination system, a collection system, first and second detectors, a device configured to receive output signals from the first and second detectors while the specimen is irradiated by the electron beam and to generate a comparison signal from the output signals, wherein the comparison signal is responsive to the height of the specimen.
摘要翻译： 用于评价试样的高度的方法和装置包括：电子束单元，具有电子束源，透镜，用于设置样本的台面并可在高度方向上控制;以及检测器，以及用于检测高度的高度检测系统 样本被放置在桌子上，而样品被电子束照射。 高度检测系统还包括照明系统，收集系统，第一和第二检测器，被配置为在样本被电子束照射的同时从第一和第二检测器接收输出信号并从输出产生比较信号的装置 信号，其中比较信号响应于样本的高度。
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2.发明授权Electron beam apparatus and method with surface height calculator and a dual projection optical unit 失效具有表面高度计算器和双投影光学单元的电子束装置和方法公开(公告)号：US07329889B2
公开(公告)日：2008-02-12
申请号：US11180672
申请日：2005-07-14
IPC分类号： G01N21/86
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electron beam apparatus including a table which mounts a specimen and is movable in three dimensional directions, an electron beam optical system irradiating an electron beam onto a specimen and for detecting a secondary electron emanated from the specimen by the irradiation of the electron beam, and a surface height detection system for detecting height of the surface of the specimen mounted on the table. A focus control system controls a relative position between a focus position of the electron optical system and the table in accordance with information of the height, and an image processing system obtains an image from the detected secondary electron and processes the obtained image to detect a defect on the surface of the specimen.
摘要翻译： 一种电子束装置，包括安装试件并可在三维方向上移动的工作台，将电子束照射到试样上并通过照射电子束来检测从试样发出的二次电子的电子束光学系统;以及 表面高度检测系统，用于检测安装在桌子上的样本的表面的高度。 焦点控制系统根据高度信息来控制电子光学系统的焦点位置与桌子之间的相对位置，并且图像处理系统从检测到的二次电子中获取图像并处理所获得的图像以检测缺陷 在样品的表面。
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3.发明授权Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus 有权电子束曝光或系统检查或测量装置及其方法和高度检测装置
公开(公告)号：US6107637A
公开(公告)日：2000-08-22
申请号：US132220
申请日：1998-08-11
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electronic beam type exposure or inspection or measurement apparatus and method including an electron optical system, an electron beam image detection optical system for detecting a secondary electron beam image generated from an inspected object by electron beams irradiated from the electron optical system, and an optical height detection apparatus for optically detecting a height of a surface in an area on the inspected object. A focus controller is provided for calculating a focus control current or a focus control voltage based on a correction parameter between a height of a surface on the inspected object and a focus control current or a focus control voltage and supplying the same to an objective lens of the electron optical system in such a manner that an electron beam is focused on the inspected object in a properly- focused state. A deflection controller is provided for correcting an image distortion containing a magnification error of an electron beam image caused on the basis of the focus control, and an image processor is provided for inspecting or measuring a pattern formed on the inspected object based on a secondary electron beam image.
摘要翻译： 一种电子束式曝光或检查或测量装置和方法，包括电子光学系统，用于通过从电子光学系统照射的电子束检测从检查对象产生的二次电子束图像的电子束图像检测光学系统和光学 高度检测装置，用于光学检测被检查物体上的区域中的表面的高度。 提供了一种聚焦控制器，用于基于检测对象上的表面的高度与聚焦控制电流或聚焦控制电压之间的校正参数来计算聚焦控制电流或聚焦控制电压，并将其提供给 电子光学系统以使得电子束以适当聚焦的状态聚焦在被检查物体上。 提供一种偏转控制器，用于校正基于焦点控制引起的包含电子束图像的放大误差的图像失真，并且提供图像处理器，用于基于二次电子来检查或测量形成在被检查物体上的图案 光束图像。
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4.发明授权Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus 有权电子束曝光或系统检查或测量装置及其方法和高度检测装置公开(公告)号：US08212227B2
公开(公告)日：2012-07-03
申请号：US12754181
申请日：2010-04-05
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of the specimen which is set on a table. The height detection system includes an illumination system configured to direct first and second beams of light through a mask with a multi-slit pattern to a surface of the specimen at substantially opposite azimuth angles and at substantially equal angles of incidence, first and second detectors which respectively detect first and second multi-slit images of the first and second beams reflected from the specimen and generate output signals thereof, and a device which receives the output signals and generates a comparison signal which is responsive to the height of the specimen. An objective lens of the electron beam unit is controlled in accordance with the comparison signal.
摘要翻译： 配备有高度检测系统的电子束装置包括向样本发射电子束的电子束单元和用于检测设置在桌子上的样本的高度的高度检测系统。 高度检测系统包括照明系统，其被配置为将第一和第二光束通过具有多狭缝图案的掩模以基本上相反的方位角和基本上相等的入射角度引导到样本的表面，第一和第二检测器 分别检测从样本反射的第一和第二光束的第一和第二多个狭缝图像，并产生其输出信号;以及接收输出信号并产生响应于样本的高度的比较信号的装置。 根据比较信号控制电子束单元的物镜。
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5.发明授权Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus 有权电子束曝光或系统检查或测量装置及其方法和高度检测装置公开(公告)号：US07692144B2
公开(公告)日：2010-04-06
申请号：US11925142
申请日：2007-10-26
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： A method and apparatus for assessing a height of a specimen includes an electron beam unit having an electron beam source, lenses, a table for setting a specimen and controllable in a height direction, and a detector, and a height detection system for detecting height of the specimen set on the table while the specimen is irradiated by an electron beam. The height detection system further includes an illumination system, a collection system, first and second detectors, a device configured to receive output signals from the first and second detectors while the specimen is irradiated by the electron beam and to generate a comparison signal from the output signals, wherein the comparison signal is responsive to the height of the specimen.
摘要翻译： 用于评价试样的高度的方法和装置包括：电子束单元，具有电子束源，透镜，用于设置样本的台面并可在高度方向上控制;以及检测器，以及用于检测高度的高度检测系统 样本被放置在桌子上，而样品被电子束照射。 高度检测系统还包括照明系统，收集系统，第一和第二检测器，被配置为在样本被电子束照射的同时从第一和第二检测器接收输出信号并从输出产生比较信号的装置 信号，其中比较信号响应于样本的高度。
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公开(公告)号：US20050242286A1
公开(公告)日：2005-11-03
申请号：US11180672
申请日：2005-07-14
IPC分类号： G01Q30/04 , G01Q30/20 , G21K7/00 , H01J37/21 , H01J37/304
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electron beam apparatus including a table which mounts a specimen and is movable in three dimensional directions, an electron beam optical system irradiating an electron beam onto a specimen and for detecting a secondary electron emanated from the specimen by the irradiation of the electron beam, and a surface height detection system for detecting height of the surface of the specimen mounted on the table. A focus control system controls a relative position between a focus position of the electron optical system and the table in accordance with information of the height, and an image processing system obtains an image from the detected secondary electron and processes the obtained image to detect a defect on the surface of the specimen.
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7.发明授权Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus 失效电子束曝光或系统检查或测量装置及其方法和高度检测装置公开(公告)号：US06919577B2
公开(公告)日：2005-07-19
申请号：US10853225
申请日：2004-05-26
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electron beam apparatus including a table which mounts a specimen and is movable in three dimensional directions, an electron beam optical system irradiating an electron beam onto a specimen and for detecting a secondary electron emanated from the specimen by the irradiation of the electron beam, and a surface height detection system for detecting height of the surface of the specimen mounted on the table. A focus control system controls a relative position between a focus position of the electron optical system and the table in accordance with information of the height, and an image processing system obtains an image from the detected secondary electron and processes the obtained image to detect a defect on the surface of the specimen.
摘要翻译： 一种电子束装置，包括安装试件并可在三维方向上移动的工作台，将电子束照射到试样上并通过照射电子束来检测从试样发出的二次电子的电子束光学系统;以及 表面高度检测系统，用于检测安装在桌子上的样本的表面的高度。 焦点控制系统根据高度信息来控制电子光学系统的焦点位置与桌子之间的相对位置，并且图像处理系统从检测到的二次电子中获取图像并处理所获得的图像以检测缺陷 在样品的表面。
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8.发明授权Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus 失效电子束曝光或系统检查或测量装置及其方法和高度检测装置公开(公告)号：US06753518B2
公开(公告)日：2004-06-22
申请号：US10012454
申请日：2001-12-12
IPC分类号： G02B704
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electron beam apparatus includes a movable table which mounts a specimen, an electron optical system including an electron beam source which emits electron beams, an element for deflecting the emitted electron beams, an objective lens for converging and irradiating the deflected electron beams onto the specimen mounted on the table, and a detector for detecting a secondary electron emanated from the specimen by the irradiation of the electron beams. A surface height detection unit is provided which optically detects a height of a surface of the specimen by projecting light onto the surface of the specimen from an oblique direction to the surface and detecting light reflected from the specimen. A focus controller is provided for focusing the electron beam onto the surface of the specimen by controlling a position of the table in a height direction in accordance with the height information from the surface height detection unit.
摘要翻译： 一种电子束装置，包括安装试件的可移动台，包括发射电子束的电子束源的电子光学系统，用于偏转发射的电子束的元件，用于会聚并将偏转的电子束照射到试样上的物镜 安装在桌子上的检测器和用于通过照射电子束来检测从样品发出的二次电子的检测器。 提供一种表面高度检测单元，其通过从表面倾斜的方向将样品投射到样品表面上并检测从样品反射的光来光学地检测样品的表面的高度。 提供了一种聚焦控制器，用于根据来自表面高度检测单元的高度信息控制桌子在高度方向上的位置，将电子束聚焦到样本表面上。
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9.发明申请Electron Beam Exposure Or System Inspection Or Measurement Apparatus And Its Method And Height Detection Apparatus 有权电子束曝光或系统检测或测量装置及其方法和高度检测装置公开(公告)号：US20100193686A1
公开(公告)日：2010-08-05
申请号：US12754181
申请日：2010-04-05
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of the specimen which is set on a table. The height detection system includes an illumination system configured to direct first and second beams of light through a mask with a multi-slit pattern to a surface of the specimen at substantially opposite azimuth angles and at substantially equal angles of incidence, first and second detectors which respectively detect first and second multi-slit images of the first and second beams reflected from the specimen and generate output signals thereof, and a device which receives the output signals and generates a comparison signal which is responsive to the height of the specimen. An objective lens of the electron beam unit is controlled in accordance with the comparison signal.
摘要翻译： 配备有高度检测系统的电子束装置包括向样本发射电子束的电子束单元和用于检测设置在桌子上的样本的高度的高度检测系统。 高度检测系统包括照明系统，其被配置为将第一和第二光束通过具有多狭缝图案的掩模以基本上相反的方位角和基本上相等的入射角度引导到样本的表面，第一和第二检测器 分别检测从样本反射的第一和第二光束的第一和第二多个狭缝图像，并产生其输出信号;以及接收输出信号并产生响应于样本的高度的比较信号的装置。 根据比较信号控制电子束单元的物镜。
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10.发明授权Electron beam exposure or system inspection of measurement apparatus and its method and height detection apparatus 有权电子束曝光或测量装置的系统检查及其方法和高度检测装置公开(公告)号：US06333510B1
公开(公告)日：2001-12-25
申请号：US09642014
申请日：2000-08-21
IPC分类号： G01N2186
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electron beam apparatus and method for at least obtaining an image of a specimen. The apparatus includes an electron optical system having an electron beam source, an element for deflecting electron beams emitted from the electron beam source, an objective lens for converting and irradiating electron beams deflected by the deflection element onto the specimen and a detector for detecting a secondary electron emanated from the specimen by irradiation of the electron beams. The apparatus further includes a projection optical system for projecting a light pattern onto a surface of the specimen in the vicinity of a beam axis of the electron optical system from an oblique direction to the surface, a detection optical system for detecting an image of the light pattern projected on the surface of the specimen and outputting information of a position of the image of the light pattern, and a surface height detection unit for outputting height information of the surface of the specimen by using the output information from the detection optical system. A focus controller is provided for focusing the electron beam onto the surface of the specimen by controlling the objective lens of the electron optical system in accordance with the height information from the surface height detection unit.
摘要翻译： 一种用于至少获得样本图像的电子束装置和方法。 该装置包括具有电子束源的电子光学系统，用于偏转从电子束源发射的电子束的元件，用于将由偏转元件偏转的电子束转换和照射到样本上的物镜，以及用于检测次级 通过照射电子束从样品发出的电子。 该装置还包括投影光学系统，用于将光图案从电子光学系统的光束轴线附近的倾斜方向投影到样本表面上，用于检测光的图像的检测光学系统 输出样本表面上的图案，并输出光图案的图像位置的信息;以及表面高度检测单元，用于通过使用来自检测光学系统的输出信息输出样本表面的高度信息。 提供了一种聚焦控制器，用于根据来自表面高度检测单元的高度信息控制电子光学系统的物镜，将电子束聚焦到样品的表面上。
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