发明授权
- 专利标题: Lithographic apparatus and method of removing liquid
- 专利标题(中): 平版印刷设备和除去液体的方法
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申请号: US11708686申请日: 2007-02-21
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公开(公告)号: US07692765B2公开(公告)日: 2010-04-06
- 发明人: Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
- 申请人: Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/58
摘要:
A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.
公开/授权文献
- US20080198344A1 Lithographic apparatus and method of removing liquid 公开/授权日:2008-08-21
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