发明授权
- 专利标题: Leveling algorithm for semiconductor manufacturing equipment and related apparatus
- 专利标题(中): 半导体制造设备及相关设备的调平算法
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申请号: US11483497申请日: 2006-07-10
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公开(公告)号: US07704826B2公开(公告)日: 2010-04-27
- 发明人: Jong-Ho Lim
- 申请人: Jong-Ho Lim
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 代理机构: F. Chau & Associates, LLC
- 优先权: KR10-2006-0013897 20060213
- 主分类号: H01L21/8242
- IPC分类号: H01L21/8242
摘要:
A method of reading surface levels of a field defined on a substrate using a sensing apparatus having at least one cell array composed of a plurality of cells, in which some of the cells constituting the at least one cell array are selected and designated as available cells. Light is radiated onto a surface of the field. Light reflected to the available cells from the surface is sensed to extract available level signals. The available level signals may be calculated to read the surface level of the field. The surface level of the field are used in a method of controlling the level of an exposure apparatus controlling the substrate mounted on a leveling stage in up, down, right, left, front, back, and rotational directions using the surface level.
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