发明授权
US07705298B2 System and method to determine focus parameters during an electron beam inspection
有权
在电子束检查期间确定焦点参数的系统和方法
- 专利标题： System and method to determine focus parameters during an electron beam inspection
- 专利标题（中）： 在电子束检查期间确定焦点参数的系统和方法
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申请号： US11939530申请日： 2007-11-13
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公开(公告)号： US07705298B2公开(公告)日： 2010-04-27
- 发明人: Xuedong Liu , Zhonghua Dong , Wei Fang , Zhong-Wei Chen
- 申请人： Xuedong Liu , Zhonghua Dong , Wei Fang , Zhong-Wei Chen
- 申请人地址： TW Hsin-Chu
- 专利权人： Hermes Microvision, Inc. (Taiwan)
- 当前专利权人： Hermes Microvision, Inc. (Taiwan)
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Sawyer Law Group, P.C.
- 主分类号： H01J37/28
- IPC分类号： H01J37/28 ; H01J37/21 ; H01J3/14
摘要：
This invention relates to apparatus and method to fast determine focus parameters in one pre-scan during an e-beam inspection practice. More specifically, embodiments of the present invention provide an apparatus and method that provide accurate focus tuning after primary focusing has been done.
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