发明授权
- 专利标题： Method of determining substrate etch depth
- 专利标题（中）： 确定衬底蚀刻深度的方法
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申请号： US11153052申请日： 2005-06-15
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公开(公告)号： US07705995B1公开(公告)日： 2010-04-27
- 发明人: Blaine D. Johs , Jeffrey S. Hale
- 申请人： Blaine D. Johs , Jeffrey S. Hale
- 申请人地址： US NE Lincoln
- 专利权人： J.A. Woollam Co., Inc.
- 当前专利权人： J.A. Woollam Co., Inc.
- 当前专利权人地址： US NE Lincoln
- 代理商 James D. Welch
- 主分类号： G01B11/02
- IPC分类号： G01B11/02
摘要：
A method of monitoring, in real time, the depth to which a process sample is etched by an etching procedure involving investigating a sample substrate that has a patterned surface which, when electromagnetic radiation in an appropriate wavelength range is caused to reflect from, demonstrates lateral interference effects, such that when a frequency transform is applied to spectroscopic reflection data, three distinguishable peaks occur, at least for some range of pattern depth in the sample surface.
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