发明授权
- 专利标题: Particle beam irradiation apparatus and particle beam irradiation method
- 专利标题(中): 粒子束照射装置和粒子束照射方法
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申请号: US11239073申请日: 2005-09-30
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公开(公告)号: US07709818B2公开(公告)日: 2010-05-04
- 发明人: Koji Matsuda , Kazuo Hiramoto , Kunio Moriyama
- 申请人: Koji Matsuda , Kazuo Hiramoto , Kunio Moriyama
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Dickstein Shapiro LLP
- 优先权: JP2004-286234 20040930; JP2005-96672 20050330
- 主分类号: A61N5/10
- IPC分类号: A61N5/10
摘要:
To ensure irradiation accuracy and safety, even when an irradiation device employing a different irradiation method is used, disclosed is herein a charged particle beam irradiation apparatus that irradiates an irradiation target with charged particle beams includes: a charged particle beam generator for generating the charged particle beams; a passive scattering irradiation device and a scanning irradiation device, both for irradiating the irradiation target with the charged particle beams; a beam transport system for transporting the charged particles beam extracted from the charged particle beam generator, to selected one of the two irradiation devices; and a central controller that modifies operating parameters on the charged particle beam generator, according to the irradiation method adopted for the selected irradiation device.