Invention Grant
- Patent Title: Imaging device in a projection exposure machine
- Patent Title (中): 投影曝光设备中的成像装置
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Application No.: US11936768Application Date: 2007-11-07
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Publication No.: US07710542B2Publication Date: 2010-05-04
- Inventor: Wolfgang Hummel , Jürgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
- Applicant: Wolfgang Hummel , Jürgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE10162289 20011219; DE10225266 20020607
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52

Abstract:
An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
Public/Granted literature
- US20080174757A1 IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE Public/Granted day:2008-07-24
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