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    Optical imaging device, particularly an objective, with at least one optical element
    4.
    发明授权
    Optical imaging device, particularly an objective, with at least one optical element 有权
    具有至少一个光学元件的光学成像装置，特别是物镜

    公开(公告)号：US06191898B1

    公开(公告)日：2001-02-20

    申请号：US09483320

    申请日：2000-01-14

    申请人： Michael Trunz ,  Ralf Hilgers ,  Erich Merz ,  Michael Mühlbeyer

    发明人： Michael Trunz ,  Ralf Hilgers ,  Erich Merz ,  Michael Mühlbeyer

    IPC分类号： G02B702

    CPC分类号： G02B7/026

    摘要： An optical imaging device, particularly an objective, is provided with at least one optical element, which is mounted in an inner ring, the inner ring being connected to an outer mount. A manipulator device serves for the displacement of the optical element in at least one direction that is perpendicular to the optical axis. By a system of peripheral slots between the inner ring and the outer mount with connecting members situated therebetween, a rotary joint between the inner ring and the outer mount, and at least one displacing rotary joint with an adjusting member between the inner ring and the outer mount as the manipulator device, a displacement of the optical element is attained with low deformation or controlled deformation of the optical element. The inner ring and the outer mount are preferably constituted monolithically.

    摘要翻译： 光学成像装置，特别是物镜，具有安装在内圈中的至少一个光学元件，内环连接到外部安装件。 操纵器装置用于在垂直于光轴的至少一个方向上移动光学元件。 通过内环和外部安装件之间的外围槽的系统，其中连接构件位于它们之间，内环和外部安装件之间的旋转接头以及至少一个带有调节构件的位移旋转接头，位于内圈和外圈之间 作为机械手装置安装，通过光学元件的低变形或受控制的变形来获得光学元件的位移。 内环和外部安装件优选地是整体构成的。

    6-mirror microlithography projection objective
    7.
    发明授权
    6-mirror microlithography projection objective 失效
    6镜微光投影物镜

    公开(公告)号：US06867913B2

    公开(公告)日：2005-03-15

    申请号：US09920285

    申请日：2001-08-01

    申请人： Hans-Jürgen Mann ,  Udo Dinger ,  Michael Mühlbeyer

    发明人： Hans-Jürgen Mann ,  Udo Dinger ,  Michael Mühlbeyer

    IPC分类号： G02B17/06 ,  G03F7/20 ,  G02B17/00

    CPC分类号： G03F7/70233 ,  G02B17/0657

    摘要： There is provided a microlithography projection objective for short wavelengths, with an entrance pupil and an exit pupil for imaging an object field in an image field, which represents a segment of a ring field, in which the segment has an axis of symmetry and an extension perpendicular to the axis of symmetry and the extension is at least 20 mm. The objective comprises a first (S1), a second (S2), a third (S3), a fourth (S4), a fifth (S5) and a sixth mirror (S6) in centered arrangement relative to an optical axis. Each of these mirrors have an off-axis segment, in which the light beams traveling through the projection objective impinge. The diameter of the off-axis segment of the first, second, third, fourth, fifth and sixth mirrors as a function of the numerical aperture NA of the objective at the exit pupil is ≦1200 mm * NA.

    摘要翻译： 提供了用于短波长的微光刻投影物镜，具有用于对图像场中的物场进行成像的入射光瞳和出射光瞳，其表示环形场的区段，其中该区段具有对称轴和延伸部 垂直于对称轴和延伸部至少为20mm。 目标包括相对于光轴居中排列的第一（S1），第二（S2），第三（S3），第四（S4），第五（S5）和第六反射镜（S6）。 这些反射镜中的每一个具有离轴部分，其中穿过投影物镜的光束撞击其中。 作为出射光瞳处的物镜的数值孔径NA的函数的第一，第二，第三，第四，第五和第六反射镜的离轴部分的直径为<= 1200MM * NA。