发明授权
US07710579B2 Measuring method and apparatus for measuring depth of trench pattern
有权
用于测量沟槽图案深度的测量方法和装置
- 专利标题: Measuring method and apparatus for measuring depth of trench pattern
- 专利标题(中): 用于测量沟槽图案深度的测量方法和装置
-
申请号: US11889391申请日: 2007-08-13
-
公开(公告)号: US07710579B2公开(公告)日: 2010-05-04
- 发明人: Shinji Yamaguchi , Masahiro Horie
- 申请人: Shinji Yamaguchi , Masahiro Horie
- 申请人地址: JP Kyoto
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JP Kyoto
- 代理机构: McDermott Will & Emery LLP
- 优先权: JPP2006-228597 20060825; JPP2007-101307 20070409
- 主分类号: G01B11/02
- IPC分类号: G01B11/02
摘要:
In a trench shape measuring apparatus, a substrate having a trench pattern extending in a predetermined trench direction on a measurement area is held by a holding part. A light emission part applies illumination light to the measurement area and reflected light of the illumination light from the measurement area is spectrally dispersed by a diffraction grating of a spectroscope, to acquire a measured spectral reflectance. Since the diffraction grating is arranged so that an angle formed between a direction on the substrate corresponding to a grating direction of the diffraction grating and the trench direction becomes 45 degrees, even if an oscillation direction of the reflected light from the substrate is limited by influence of the trench pattern, it is possible to accurately obtain a spectral reflectance of the measurement area without influence of polarization of the reflected light and obtain a depth of the trench pattern with accuracy.
公开/授权文献
信息查询