发明授权
- 专利标题： Method for recycling of ion implantation monitor wafers
- 专利标题（中）： 离子注入监测晶圆回收方法
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申请号： US12023224申请日： 2008-01-31
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公开(公告)号： US07732303B2公开(公告)日： 2010-06-08
- 发明人: Steven Ross Codding , Joseph R. Greco , Timothy Charles Krywanczyk
- 申请人： Steven Ross Codding , Joseph R. Greco , Timothy Charles Krywanczyk
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Schmeiser, Olsen & Watts
- 代理商 Riyon W. Harding
- 主分类号： H01L21/322
- IPC分类号： H01L21/322
摘要：
A method of recycling monitor wafers. The method includes: (a) providing a semiconductor wafer which includes a dopant layer extending from a top surface of the wafer into the wafer a distance less than a thickness of the wafer, the dopant layer containing dopant species; after (a), (b) attaching an adhesive tape to a bottom surface of the wafer; after (b), (c) removing the dopant layer; and after (c), (d) removing the adhesive tape.
公开/授权文献
- US20090197400A1 METHOD FOR RECYCLING OF ION IMPLANTATION MONITOR WAFERS 公开/授权日：2009-08-06
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