发明授权
- 专利标题: Apparatus for manufacturing a process abatement reactor
- 专利标题(中): 用于制造工艺消除反应器的装置
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申请号: US11555056申请日: 2006-10-31
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公开(公告)号: US07736600B2公开(公告)日: 2010-06-15
- 发明人: Daniel O. Clark , Sebastien Raoux , Robbert M. Vermeulen , Shaun W. Crawford
- 申请人: Daniel O. Clark , Sebastien Raoux , Robbert M. Vermeulen , Shaun W. Crawford
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Dugan & Dugan, PC
- 主分类号: B01D50/00
- IPC分类号: B01D50/00
摘要:
A thermal reactor for use during the abatement of a semiconductor manufacturing process is provided, including a thermal reaction unit having: an interior porous wall that defines a central chamber, the interior porous wall formed from a plurality of stacked porous sections; at least one gas inlet in fluid communication with the central chamber and adapted to introduce gaseous waste stream to the central chamber; a thermal mechanism positioned within the central chamber and adapted to decompose the gaseous waste stream within the central chamber, thereby forming reaction products; and a fluid delivery system adapted to provide a fluid to the central chamber through the interior porous wall at a sufficient force to reduce deposition of reaction products on an inner surface of the interior porous wall of the central chamber; wherein at least one of the porous sections has one or more of: a property that varies within the porous section; and a property that differs from a property of at least one other porous section of the interior porous wall.