摘要:
A system for treating flammable effluent gas is provided. The system includes an exhaust conduit to carry the flammable effluent gas to an abatement unit, a control system coupled to the abatement unit to determine an operating parameter of the abatement unit, a bypass valve coupled to the exhaust conduit which is an operative responsive to the monitoring system, and a source of second gas to be mixed with the effluent gas diverted from the abatement unit when the bypass valve is operating in a bypass mode to provide a mixed gas having a flammability lower than the effluent gas. Methods of the invention as well as numerous other aspects are provided.
摘要:
An abatement apparatus for introducing fuel into an electronic device manufacturing effluent abatement tool, including: a manifold; a fuel source adapted to supply fuel to the manifold through a fuel conduit; and a plurality of nozzles adapted to receive fuel from the manifold; wherein the manifold is adapted to supply fuel to the nozzles at a fuel velocity greater than a flame velocity.
摘要:
A flame sensor apparatus for use with a flame heated thermal abatement reactor is provided, including a flame sensor adapted to sense a flame within the thermal abatement reactor; and a shutter adapted to selectively block the transmission of radiation from the flame to the flame sensor.
摘要:
A method of developing an integrated abatement system is provided, including the steps: a) determining whether an integrated abatement system meets a destruction removal efficiency standard wherein the determination includes the steps: i) operating an electronic device manufacturing process tool using a best known method, whereby effluent containing a target species is produced; ii) abating the target species to form abated effluent, using an abatement system which is coupled to the process tool; and iii) calculating a destruction removal efficiency for the target species; and b) modifying the abatement system by altering at least one of a design parameter and an operating parameter of the abatement system to improve the destruction removal efficiency. Numerous other aspects are provided.
摘要:
A thermal reactor for use during the abatement of a semiconductor manufacturing process is provided, including a thermal reaction unit having: an interior porous wall that defines a central chamber, the interior porous wall formed from a plurality of stacked porous sections; at least one gas inlet in fluid communication with the central chamber and adapted to introduce gaseous waste stream to the central chamber; a thermal mechanism positioned within the central chamber and adapted to decompose the gaseous waste stream within the central chamber, thereby forming reaction products; and a fluid delivery system adapted to provide a fluid to the central chamber through the interior porous wall at a sufficient force to reduce deposition of reaction products on an inner surface of the interior porous wall of the central chamber; wherein at least one of the porous sections has one or more of: a property that varies within the porous section; and a property that differs from a property of at least one other porous section of the interior porous wall.
摘要:
In some aspects, an apparatus for abating effluent from an electronic device manufacturing process tool is provided, including: a reaction chamber adapted to receive an effluent; and a reagent heating apparatus in fluid connection with the reaction chamber; wherein the reagent heating apparatus is adapted to heat a reagent and to introduce the heated reagent into a heated reagent reaction zone of the reaction chamber; and wherein the reaction chamber is further adapted to mix the effluent and the heated reagent in the heated reagent reaction zone. Other apparatus and methods are disclosed.
摘要:
The present invention provides systems, methods, and apparatus for abating effluent from an electronic device manufacturing system using cogeneration. The invention includes a pump adapted to couple to a processing chamber and adapted to draw effluent from the processing chamber; a reaction chamber coupled to the pump and adapted to receive the effluent from the pump; and a turbine coupled to the reaction chamber and adapted to be driven by combustion gases from the reaction chamber. The turbine is adapted to generate power which is applied to operate the pump. Numerous additional aspects are disclosed.
摘要:
A method for abating effluent from an electronic device manufacturing process is provided, including abating the effluent in a thermal abatement tool to form abated effluent; determining whether the abated effluent contains one or more chemical species of interest; and changing one or more operating parameters of the thermal abatement tool based upon the determination. Numerous other embodiments are provided.
摘要:
In one aspect, a method of forming a silicon layer on a substrate is provided, including the steps providing a substrate; and introducing hydrogen and silane into a chamber containing the substrate such that a layer of silicon is deposited on the substrate; wherein the silane is less than about 99.999% pure. Numerous other aspects are provided.
摘要:
This invention is an antistatic thermoplastic, phase-segregated polyurethane containing, as an antistatic additive an effective amount of a monovalent metal tetraphenylboron salt, in the substantial absence of a fatty acid salt, a C.sub.6 -C.sub.30 carboxylic acid ester or phosphate ester compound.Suprisingly, it has been found that, with this particular type of polyurethane, tetraphenylboron salts are very effective antistatic additives even in the absence of enhancer compounds as were previously employed. Accordingly, the antistatic polyurethane is useful for applications such as electronics components and packaging, and other applications where static dissipative ability is needed or desirable.