发明授权
- 专利标题： Antireflective coating composition based on silicon polymer
- 专利标题（中）： 基于硅聚合物的抗反射涂料组合物
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申请号： US11676671申请日： 2007-02-20
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公开(公告)号： US07736837B2公开(公告)日： 2010-06-15
- 发明人: David Abdallah , Ruzhi Zhang
- 申请人： David Abdallah , Ruzhi Zhang
- 申请人地址： US NJ Somerville
- 专利权人： AZ Electronic Materials USA Corp.
- 当前专利权人： AZ Electronic Materials USA Corp.
- 当前专利权人地址： US NJ Somerville
- 代理商 Sangya Jain
- 主分类号： G03F7/095
- IPC分类号： G03F7/095 ; G03F7/11 ; G03F7/30 ; C08G77/04 ; G03F7/40 ; C08G77/38
摘要：
The present invention relates to an antireflecting coating composition which is capable of forming a crosslinked coating underneath a layer of photoresist comprising a silicon polymer, where the silicon polymer comprises at least one unit with the structure 1, where, R1 is selected from C1-C4 alkyl. The invention also relates to a process for imaging this composition.