发明授权
- 专利标题: Pattern forming method and pattern forming system
- 专利标题(中): 图案形成方法和图案形成系统
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申请号: US11626402申请日: 2007-01-24
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公开(公告)号: US07745237B2公开(公告)日: 2010-06-29
- 发明人: Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
- 申请人: Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2006-014525 20060124
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; H01L21/461 ; G01R31/26
摘要:
Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
公开/授权文献
- US20070172967A1 PATTERN FORMING METHOD AND PATTERN FORMING SYSTEM 公开/授权日:2007-07-26
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