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US07745237B2 Pattern forming method and pattern forming system 有权
图案形成方法和图案形成系统

Pattern forming method and pattern forming system
摘要:
Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
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