Invention Grant
US07756249B1 Compact multi-focus x-ray source, x-ray diffraction imaging system, and method for fabricating compact multi-focus x-ray source 有权
紧凑型多焦点x射线源,x射线衍射成像系统和制造紧凑型多焦点x射线源的方法

  • Patent Title: Compact multi-focus x-ray source, x-ray diffraction imaging system, and method for fabricating compact multi-focus x-ray source
  • Patent Title (中): 紧凑型多焦点x射线源,x射线衍射成像系统和制造紧凑型多焦点x射线源的方法
  • Application No.: US12388907
    Application Date: 2009-02-19
  • Publication No.: US07756249B1
    Publication Date: 2010-07-13
  • Inventor: Geoffrey Harding
  • Applicant: Geoffrey Harding
  • Applicant Address: US CA Newark
  • Assignee: Morpho Detection, Inc.
  • Current Assignee: Morpho Detection, Inc.
  • Current Assignee Address: US CA Newark
  • Agency: Armstrong Teasdale LLP
  • Main IPC: G01N23/201
  • IPC: G01N23/201
Compact multi-focus x-ray source, x-ray diffraction imaging system, and method for fabricating compact multi-focus x-ray source
Abstract:
A multi-focus x-ray source (MFXS) for a multiple inverse fan beam x-ray diffraction imaging (MIFB XDI) system. The MFXS includes a plurality of focus points (N) defined along a length of the MFXS collinear with the y-axis. The MFXS is configured to generate the plurality of primary beams, and at least M coherent x-ray scatter detectors are configured to detect coherent scatter rays from the primary beams as the primary beams propagate through a section of the object positioned within the examination area when a spacing P between adjacent coherent x-ray scatter detectors satisfies the equation: P = W s · V M · U , where Ws is a lateral extent of the plurality of focus points, U is a distance from the y-axis to a top surface of the examination area, and V is a distance from the top surface to the line at the coordinate X=L.
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