发明授权
- 专利标题： Low activation energy dissolution modification agents for photoresist applications
- 专利标题（中）： 用于光刻胶应用的低活化能溶解改性剂
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申请号： US12019676申请日： 2008-01-25
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公开(公告)号： US07759044B2公开(公告)日： 2010-07-20
- 发明人: Robert David Allen , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong
- 申请人： Robert David Allen , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Schmeiser, Olsen & Watts
- 主分类号： G03C1/00
- IPC分类号： G03C1/00 ; C07D305/00 ; C07D307/02 ; C07D307/77 ; C07D307/00 ; C07D493/00 ; C07D307/93 ; C07C69/74 ; C07C69/00
摘要：
A dissolution modification agent suitable for use in a photoresist composition including a polymer, a photoacid generator and casting solvent. The dissolution modification agent is insoluble in aqueous alkaline developer and inhibits dissolution of the polymer in the developer until acid is generated by the photoacid generator being exposed to actinic radiation, whereupon the dissolution modifying agent, at a suitable temperature, becomes soluble in the developer and allows the polymer to dissolve in the developer. The DMAs are glucosides, cholates, citrates and adamantanedicarboxylates protected with acid-labile ethoxyethyl, tetrahydrofuranyl, and angelicalactonyl groups.
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