发明授权
- 专利标题： Methods and apparatus for changing the optical properties of resists
- 专利标题（中）： 改变抗蚀剂光学性能的方法和装置
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申请号： US11535247申请日： 2006-09-26
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公开(公告)号： US07763404B2公开(公告)日： 2010-07-27
- 发明人: James E. Willis , Manuel Perez , Asao Yamashita
- 申请人： James E. Willis , Manuel Perez , Asao Yamashita
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 主分类号： G03F9/00
- IPC分类号： G03F9/00
摘要：
The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.
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