发明授权
- 专利标题: Ex-situ removal of deposition on an optical element
- 专利标题(中): 在光学元件上原位去除沉积
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申请号: US11527728申请日: 2006-09-27
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公开(公告)号: US07767989B2公开(公告)日: 2010-08-03
- 发明人: Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
- 申请人: Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G03B7/20
- IPC分类号: G03B7/20
摘要:
A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
公开/授权文献
- US20070069162A1 Ex-situ removal of deposition on an optical element 公开/授权日:2007-03-29
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