发明授权
- 专利标题: Wafer level packaging integrated hydrogen getter
- 专利标题(中): 晶圆级封装集成吸气剂
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申请号: US11782460申请日: 2007-07-24
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公开(公告)号: US07777318B2公开(公告)日: 2010-08-17
- 发明人: Kelly Jill Tornquist Hennig , Patty Pei-Ling Chang-Chien , Xianglin Zeng , Jeffrey Ming-Jer Yang
- 申请人: Kelly Jill Tornquist Hennig , Patty Pei-Ling Chang-Chien , Xianglin Zeng , Jeffrey Ming-Jer Yang
- 申请人地址: US CA Los Angeles
- 专利权人: Northrop Grumman Systems Corporation
- 当前专利权人: Northrop Grumman Systems Corporation
- 当前专利权人地址: US CA Los Angeles
- 代理机构: Miller IP Group, PLC
- 代理商 John A. Miller
- 主分类号: H01L23/20
- IPC分类号: H01L23/20
摘要:
A wafer-level package that employs one or more integrated hydrogen getters within the wafer-level package on a substrate wafer or a cover wafer. The hydrogen getters are provided between and among the integrated circuits on the substrate wafer or the cover wafer, and are deposited during the integrated circuit fabrication process. In one non-limiting embodiment, the substrate wafer is a group III-V semiconductor material, and the hydrogen getter includes a titanium layer, a nickel layer, and a palladium layer.
公开/授权文献
- US20090026598A1 Wafer Level Packaging Integrated Hydrogen Getter 公开/授权日:2009-01-29
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