发明授权
- 专利标题： Nanoimprint molds and methods of forming the same
- 专利标题（中）： 纳米压印模具及其形成方法
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申请号： US11521235申请日： 2006-09-14
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公开(公告)号： US07780431B2公开(公告)日： 2010-08-24
- 发明人: Zhaoning Yu , Wei Wu , Carl E. Picciotto , Jun Gao
- 申请人： Zhaoning Yu , Wei Wu , Carl E. Picciotto , Jun Gao
- 申请人地址： US TX Houston
- 专利权人： Hewlett-Packard Development Company, L.P.
- 当前专利权人： Hewlett-Packard Development Company, L.P.
- 当前专利权人地址： US TX Houston
- 主分类号： B29C33/00
- IPC分类号： B29C33/00
摘要：
A nanoimprint mold includes a substrate having at least one substantially non-transferable feature and at least one transferable feature defined at different portions thereon. Methods for forming the same are also disclosed.
公开/授权文献
- US20080067721A1 Nanoimprint molds and methods of forming the same 公开/授权日：2008-03-20
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