发明授权
US07781244B2 Method of manufacturing nitride-composite semiconductor laser element, with disclocation control
有权
具有位移控制的氮化物复合半导体激光元件的制造方法
- 专利标题: Method of manufacturing nitride-composite semiconductor laser element, with disclocation control
- 专利标题(中): 具有位移控制的氮化物复合半导体激光元件的制造方法
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申请号: US12211577申请日: 2008-09-16
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公开(公告)号: US07781244B2公开(公告)日: 2010-08-24
- 发明人: Shigetoshi Ito , Takayuki Yuasa , Yoshihiro Ueta , Mototaka Taneya , Zenpei Tani , Kensaku Motoki
- 申请人: Shigetoshi Ito , Takayuki Yuasa , Yoshihiro Ueta , Mototaka Taneya , Zenpei Tani , Kensaku Motoki
- 申请人地址: JP Osaka-shi JP Osaka-shi
- 专利权人: Sharp Kabushiki Kaisha,Sumitomo Electric Industries, Ltd.
- 当前专利权人: Sharp Kabushiki Kaisha,Sumitomo Electric Industries, Ltd.
- 当前专利权人地址: JP Osaka-shi JP Osaka-shi
- 代理机构: Morrison & Foerster LLP
- 优先权: JP2001-330068 20011029; JP2001-330181 20011029
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A nitride semiconductor laser device with a reduction in internal crystal defects and an alleviation in stress, and a semiconductor optical apparatus comprising this nitride semiconductor laser device. First, a growth suppressing film against GaN crystal growth is formed on the surface of an n-type GaN substrate equipped with alternate stripes of dislocation concentrated regions showing a high density of crystal defects and low-dislocation regions so as to coat the dislocation concentrate regions. Next, the n-type GaN substrate coated with the growth suppressing film is overlaid with a nitride semiconductor layer by the epitaxial growth of GaN crystals. Further, the growth suppressing film is removed to adjust the lateral distance between a laser waveguide region and the closest dislocation concentrated region to 40 μm or more.
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