发明授权
- 专利标题： Inductor device and method of manufacturing the same
- 专利标题（中）： 电感器件及其制造方法
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申请号： US12186317申请日： 2008-08-05
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公开(公告)号： US07791446B2公开(公告)日： 2010-09-07
- 发明人: Tomoharu Fujii , Masahiro Sunohara , Manabu Nakamura
- 申请人： Tomoharu Fujii , Masahiro Sunohara , Manabu Nakamura
- 申请人地址： JP Nagano-shi, Nagano
- 专利权人： Shinko Electric Industries Co., Ltd.
- 当前专利权人： Shinko Electric Industries Co., Ltd.
- 当前专利权人地址： JP Nagano-shi, Nagano
- 代理机构： Drinker Biddle & Reath LLP
- 优先权： JP2007-204325 20070806
- 主分类号： H01F5/00
- IPC分类号： H01F5/00
摘要：
An inductor device formed on a semiconductor substrate includes an inductor body penetrating the semiconductor substrate, taking a spiral shape and having a conductivity, and an insulating film provided between a side surface of the inductor body and the semiconductor substrate.
公开/授权文献
- US20090039999A1 INDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 公开/授权日：2009-02-12
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