发明授权
- 专利标题： Opto-thermal mask including aligned thermal dissipative layer, reflective layer and transparent capping layer
- 专利标题（中）： 光热掩模包括对准的热耗散层，反射层和透明覆盖层
-
申请号： US11355799申请日： 2006-02-16
-
公开(公告)号： US07804148B2公开(公告)日： 2010-09-28
- 发明人: Louis L. Hsu , Jack A. Mandelman , Chandrasekhar Narayan , Chun-Yung Sung
- 申请人： Louis L. Hsu , Jack A. Mandelman , Chandrasekhar Narayan , Chun-Yung Sung
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理商 Thomas A. Beck; Daniel P. Morris
- 主分类号： H01L23/58
- IPC分类号： H01L23/58 ; H01L31/058 ; H01L31/02 ; H01L31/0232 ; H01L31/024 ; H01L21/033 ; H01L21/00
摘要：
An opto-thermal annealing mask stack layer includes a thermal dissipative layer located over a substrate. A reflective layer is located upon the thermal dissipative layer. A transparent capping layer, that may have a thickness from about 10 to about 100 angstroms, is located upon the reflective layer. The opto-thermal annealing mask layer may be used as a gate electrode within a field effect device.
公开/授权文献
- US20070187670A1 Opto-thermal annealing mask and method 公开/授权日：2007-08-16
信息查询
IPC分类:
