发明授权
- 专利标题： Projection exposure apparatus and method for operating the same
- 专利标题（中）： 投影曝光装置及其操作方法
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申请号： US11427183申请日： 2006-06-28
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公开(公告)号： US07808615B2公开(公告)日： 2010-10-05
- 发明人: Toralf Gruner , Olaf Conradi , Nils Dieckmann , Markus Schwab , Olaf Dittmann , Michael Totzeck , Daniel Kraehmer , Vladimir Kamenov
- 申请人： Toralf Gruner , Olaf Conradi , Nils Dieckmann , Markus Schwab , Olaf Dittmann , Michael Totzeck , Daniel Kraehmer , Vladimir Kamenov
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT AG
- 当前专利权人： Carl Zeiss SMT AG
- 当前专利权人地址： DE Oberkochen
- 代理机构： Fish & Richardson P.C.
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G03B27/32
摘要：
The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in an image plane (8). The object (5) is illuminated with light of an operating wavelength of the projection exposure apparatus according to one of several adjustable exposure modes. The light produces changes in at least one optical element (9) of the projection exposure apparatus, by which the optical properties of the projection exposure apparatus are influenced. The operation of the projection exposure apparatus makes allowance for the influencing of the optical properties of the projection exposure apparatus or a quantity dependent on the former, being calculated approximately on the basis of the exposure mode used and the structure of the object (5).