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    Projection Exposure System and Projection Exposure Method
    1.
    发明申请
    Projection Exposure System and Projection Exposure Method 有权
    投影曝光系统和投影曝光方法

    公开(公告)号：US20130182234A1

    公开(公告)日：2013-07-18

    申请号：US13786134

    申请日：2013-03-05

    申请人： Paul Graupner ,  Olaf Conradi ,  Christoph Zaczek ,  Wilhelm Ulrich ,  Helmut Beierl ,  Toralf Gruner ,  Volker Graeschus

    发明人： Paul Graupner ,  Olaf Conradi ,  Christoph Zaczek ,  Wilhelm Ulrich ,  Helmut Beierl ,  Toralf Gruner ,  Volker Graeschus

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70191 ,  G03F7/70308

    摘要： A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.

    摘要翻译： 投影曝光系统包括被配置为用辐射照射掩模的照明系统。 投影曝光系统还包括被配置为将掩模的图案的图像投影到辐射敏感基板上的投影物镜。 投影曝光系统还包括在物镜表面光学下游的投影光束路径中布置在投影物镜的场表面处或其附近的角度选择滤光器装置。 角度选择滤波器装置可以根据角度选择滤波器功能对入射到滤波器装置上的辐射进行滤波。

    Optical system and method of use
    2.
    发明授权
    Optical system and method of use 有权

    公开(公告)号：US08462315B2

    公开(公告)日：2013-06-11

    申请号：US12432921

    申请日：2009-04-30

    申请人： Olaf Conradi

    发明人： Olaf Conradi

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70266 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70891

    摘要： A method for improving imaging properties of an optical system and an optical system of this type having improved imaging properties are described. The optical system can have a plurality of optical elements. In some embodiments, an optical element is positioned and/or deformed by mechanical force action and by thermal action. In certain embodiments, one optical element is positioned and/or deformed by mechanical force action and another optical element is deformed by thermal action.

    Method for Improving the Imaging Properties of a Projection Objective, and Such a Projection Objective
    5.
    发明申请
    Method for Improving the Imaging Properties of a Projection Objective, and Such a Projection Objective 有权
    改进投影目标成像特性的方法，以及这样的投影目标

    公开(公告)号：US20080310029A1

    公开(公告)日：2008-12-18

    申请号：US11915191

    申请日：2006-05-24

    申请人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

    发明人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

    IPC分类号： G02B17/08 ,  G02B27/18

    CPC分类号： G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

    摘要： The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

    摘要翻译： 本发明涉及一种用于改善微光刻投影物镜（50）的成像特性的方法，其中投影物镜在物体之间具有多个透镜（L1，L2，L3，L4，L5，L6，L7，L8） 平面和图像平面，多个透镜的第一透镜被分配用于主动变形透镜的第一操纵器（ml，Mn），第一透镜被变形以至少部分地校正像差，至少一个第二透镜 多个透镜还被分配至少一个第二操纵器，并且第二透镜除了第一透镜之外也变形。 此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

    Method and system for correcting image changes
    7.
    发明授权
    Method and system for correcting image changes 有权
    用于校正图像变化的方法和系统

    公开(公告)号：US08325323B2

    公开(公告)日：2012-12-04

    申请号：US12361842

    申请日：2009-01-29

    申请人： Olaf Conradi ,  Toralf Gruner

    发明人： Olaf Conradi ,  Toralf Gruner

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70891 ,  G03F7/70258

    摘要： The disclosure relates to a method for compensating image errors, generated by intensity distributions in optical systems, such as in projection lens arrays of microlithography systems, and to respective optical systems, such as projection lens arrays of microlithography systems.

    摘要翻译： 本公开涉及一种用于补偿由光学系统中的强度分布产生的图像误差的方法，例如在微光刻系统的投影透镜阵列中，以及相应的光学系统，例如微光刻系统的投影透镜阵列。

    OPTICAL SYSTEM AND METHOD OF USE
    10.
    发明申请
    OPTICAL SYSTEM AND METHOD OF USE 有权
    光学系统及其使用方法

    公开(公告)号：US20090231565A1

    公开(公告)日：2009-09-17

    申请号：US12432921

    申请日：2009-04-30

    申请人： Olaf Conradi

    发明人： Olaf Conradi

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70266 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70891

    摘要： A method for improving imaging properties of an optical system and an optical system of this type having improved imaging properties are described. The optical system can have a plurality of optical elements. In some embodiments, an optical element is positioned and/or deformed by mechanical force action and by thermal action. In certain embodiments, one optical element is positioned and/or deformed by mechanical force action and another optical element is deformed by thermal action.

    摘要翻译： 描述了一种用于改善具有改进的成像特性的光学系统和这种类型的光学系统的成像特性的方法。 光学系统可以具有多个光学元件。 在一些实施例中，通过机械力作用和热作用来定位和/或变形光学元件。 在某些实施例中，通过机械力作用定位和/或变形一个光学元件，另一个光学元件通过热作用而变形。