发明授权
US07808839B2 Split gate NAND flash memory structure and array, method of programming, erasing and reading thereof, and method of manufacturing 有权
分闸门NAND闪存结构和阵列,编程方法,擦除和读取方法以及制造方法

Split gate NAND flash memory structure and array, method of programming, erasing and reading thereof, and method of manufacturing
摘要:
A split gate NAND flash memory structure is formed on a semiconductor substrate of a first conductivity type. The NAND structure comprises a first region of a second conductivity type in the substrate with a second region of the second conductivity type in the substrate, spaced apart from the first region. A continuous first channel region is defined between the first region and the second region. A plurality of floating gates are spaced apart from one another with each positioned over a separate portion of the channel region. A plurality of control gates are provided with each associated with and adjacent to a floating gate. Each control gate has two portions: a first portion over a portion of the channel region and a second portion over the associated floating gate and capacitively coupled thereto.
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