发明授权
US07829195B2 Fluorination pre-treatment of heat spreader attachment indium thermal interface material 有权
散热器氟化预处理附着铟热界面材料

  • 专利标题: Fluorination pre-treatment of heat spreader attachment indium thermal interface material
  • 专利标题(中): 散热器氟化预处理附着铟热界面材料
  • 申请号: US11618905
    申请日: 2006-12-31
  • 公开(公告)号: US07829195B2
    公开(公告)日: 2010-11-09
  • 发明人: Bogdan M. Simion
  • 申请人: Bogdan M. Simion
  • 申请人地址: US CA Santa Clara
  • 专利权人: Intel Corporation
  • 当前专利权人: Intel Corporation
  • 当前专利权人地址: US CA Santa Clara
  • 代理机构: Konrad Raynes & Victor LLP
  • 代理商 Alan S. Raynes
  • 主分类号: B32B5/02
  • IPC分类号: B32B5/02
Fluorination pre-treatment of heat spreader attachment indium thermal interface material
摘要:
The formation of electronic assemblies including a heat spreader coupled to a die through a thermal interface material formed from an indium preform, is described. One embodiment relates to a method including providing a preform comprising indium, the preform including an indium oxide layer thereon. The method also includes exposing the preform to fluorine so that part of the indium oxide layer is transformed into an indium oxy-fluoride. The method may also include, after the exposing the preform to fluorine so that part of the indium oxide layer is transformed into an indium oxy-fluoride, positioning the preform between a die and a heat sink, and applying pressure to and heating the preform positioned between the die and the heat sink so that reflow occurs and a bond is formed between the die and the heat sink.
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