Invention Grant
- Patent Title: Antireflective hardmask composition and methods for using same
- Patent Title (中): 防反射硬掩模组合物及其使用方法
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Application No.: US11348203Application Date: 2006-02-06
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Publication No.: US07829638B2Publication Date: 2010-11-09
- Inventor: Dong Seon Uh , Chang Il Oh , Do Hyeon Kim , Jin Kuk Lee , Irina Nam
- Applicant: Dong Seon Uh , Chang Il Oh , Do Hyeon Kim , Jin Kuk Lee , Irina Nam
- Applicant Address: KR
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, PA
- Priority: KR10-2005-0038406 20050509; KR10-2005-0068348 20050727
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/039
Abstract:
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided.
Public/Granted literature
- US20060251990A1 Antireflective hardmask composition and methods for using same Public/Granted day:2006-11-09
Information query
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