发明授权
- 专利标题: Quantum dot semiconductor device
- 专利标题(中): 量子点半导体器件
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申请号: US12047806申请日: 2008-03-13
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公开(公告)号: US07829880B2公开(公告)日: 2010-11-09
- 发明人: Hiroji Ebe , Kenichi Kawaguchi , Ken Morito , Yasuhiko Arakawa
- 申请人: Hiroji Ebe , Kenichi Kawaguchi , Ken Morito , Yasuhiko Arakawa
- 申请人地址: JP Kawasaki JP Tokyo
- 专利权人: Fujitsu Limited,The University of Tokyo
- 当前专利权人: Fujitsu Limited,The University of Tokyo
- 当前专利权人地址: JP Kawasaki JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: JP2007-084129 20070328
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L31/00
摘要:
A quantum dot semiconductor device includes an active layer having a plurality of quantum dot layers each including a composite quantum dot formed by stacking a plurality of quantum dots and a side barrier layer formed in contact with a side face of the composite quantum dot. The stack number of the quantum dots and the magnitude of strain of the side barrier layer from which each of the quantum dot layers is formed are set so that a gain spectrum of the active layer has a flat gain bandwidth corresponding to a shift amount of the gain spectrum within a desired operation temperature range.
公开/授权文献
- US20080308788A1 QUANTUM DOT SEMICONDUCTOR DEVICE 公开/授权日:2008-12-18
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