Invention Grant
- Patent Title: Method and system for yield similarity of semiconductor devices
- Patent Title (中): 半导体器件产量相似性的方法和系统
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Application No.: US11853794Application Date: 2007-09-11
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Publication No.: US07831409B2Publication Date: 2010-11-09
- Inventor: Eugene Wang
- Applicant: Eugene Wang
- Applicant Address: CN Shanghai
- Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee Address: CN Shanghai
- Agency: Townsend and Townsend and Crew LLP
- Priority: CN200410025413 20040614
- Main IPC: G06F17/18
- IPC: G06F17/18

Abstract:
Method and system for yield similarity of semiconductor devices. Embodiments of the present invention provides a method for yield similarity of semiconductor devices. The method includes providing a first plurality of semiconductor devices and a second plurality of semiconductor devices. The method also includes obtaining a first plurality of yields associated with a first yield related to the first plurality of semiconductor devices. The method further includes obtaining a second plurality of yields associated with a second yield related to the second plurality of semiconductor devices. The method also includes providing a processor and performing a first statistical analysis for the first plurality of yields using at least the processor. The method includes determining a first statistical distribution based on at least information associated with the first statistical analysis. The method includes performing a second statistical analysis for the second plurality of yields.
Public/Granted literature
- US20080221831A1 METHOD AND SYSTEM FOR YIELD SIMILARITY OF SEMICONDUCTOR DEVICES Public/Granted day:2008-09-11
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