发明授权
US07835177B2 Phase change memory cell and method of fabricating 有权
相变存储单元及其制造方法

Phase change memory cell and method of fabricating
摘要:
A phase change memory (PCM) cell fabricated by etching a tapered structure into a phase change layer, and planarizing a dielectric layer on the phase change layer until a tip of the tapered structure is exposed for contacting a heating electrode. Therefore, the area of the exposed tip of the phase change layer is controlled to be of an extremely small size, the contact area between the phase change layer and the heating electrode is reduced, thereby lowering the operation current.
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