Invention Grant
- Patent Title: Vertical nitride semiconductor light emitting diode and method of manufacturing the same
- Patent Title (中): 垂直氮化物半导体发光二极管及其制造方法
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Application No.: US12544868Application Date: 2009-08-20
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Publication No.: US07838317B2Publication Date: 2010-11-23
- Inventor: Sang Ho Yoon , Su Yeol Lee , Doo Go Baik , Seok Beom Choi , Tae Sung Jang , Jong Gun Woo
- Applicant: Sang Ho Yoon , Su Yeol Lee , Doo Go Baik , Seok Beom Choi , Tae Sung Jang , Jong Gun Woo
- Applicant Address: KR Gyunggi-Do
- Assignee: Samsung LED Co., Ltd.
- Current Assignee: Samsung LED Co., Ltd.
- Current Assignee Address: KR Gyunggi-Do
- Agency: Lowe Hauptman Ham & Berner LLP
- Priority: KR10-2006-0078617 20060821; KR10-2007-0025229 20070314
- Main IPC: H01L21/56
- IPC: H01L21/56

Abstract:
A vertical nitride-based semiconductor LED comprises a structure support layer; a p-electrode formed on the structure support layer; a p-type nitride semiconductor layer formed on the p-electrode; an active layer formed on the p-type nitride semiconductor layer; an n-type nitride semiconductor layer formed on the active layer; an n-electrode formed on a portion of the n-type nitride semiconductor layer; and a buffer layer formed on a region of the n-type nitride semiconductor layer on which the n-electrode is not formed, the buffer layer having irregularities formed thereon. The surface of the n-type nitride semiconductor layer coming in contact with the n-electrode is flat.
Public/Granted literature
- US20090311817A1 VERTICAL NITRIDE SEMICONDUCTOR LIGHT EMITTING DIODE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-12-17
Information query
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