Invention Grant
US07841582B2 Variable seal pressure slit valve doors for semiconductor manufacturing equipment
有权
用于半导体制造设备的可变密封压力狭缝阀门
- Patent Title: Variable seal pressure slit valve doors for semiconductor manufacturing equipment
- Patent Title (中): 用于半导体制造设备的可变密封压力狭缝阀门
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Application No.: US10990125Application Date: 2004-11-16
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Publication No.: US07841582B2Publication Date: 2010-11-30
- Inventor: Won B. Bang , Toan Q. Tran , Yen-Kun Victor Wang
- Applicant: Won B. Bang , Toan Q. Tran , Yen-Kun Victor Wang
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Townsend and Townsend and Crew
- Main IPC: F16K25/00
- IPC: F16K25/00
Abstract:
Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door. A valve actuator switch provides a first or second pressure to the actuator depending on the pressure inside a first chamber. In one embodiment, a sensor monitors the pressure inside the first chamber.
Public/Granted literature
- US20050269334A1 Variable seal pressure slit valve doors for semiconductor manufacturing equipment Public/Granted day:2005-12-08
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