公开(公告)号：US07806383B2

公开(公告)日：2010-10-05

申请号：US11756632

申请日：2007-06-01

Applicant: Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei ,  Won Bang

Inventor： Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei ,  Won Bang

IPC: F16K25/00

CPC classification number: H01L21/67126

Abstract: Embodiments of a valve assembly for a process chamber having improved seal performance are provided herein. In some embodiments, a valve assembly for a process chamber includes a housing having an opening disposed in a wall thereof and through which a substrate may be transferred; a door movably coupled to the housing in a plane substantially parallel to the wall of the housing for selectively sealing the opening; a compressible sealing member disposed at least partly between an upper surface of the door and a corresponding surface of the housing for forming a seal therebetween by compression of the compressible sealing member in a direction substantially perpendicular to the wall when the door is in a closed position; and a mechanism for restricting the exposure of the compressible sealing member to an environment on a process chamber side of the housing.

Abstract translation: 本文提供了具有改进的密封性能的用于处理室的阀组件的实施例。 在一些实施例中，用于处理室的阀组件包括壳体，该壳体具有设置在其壁中的开口，并且基板可以通过该壳体被转移; 门，其基本上平行于壳体的壁可移动地联接到壳体，用于选择性地密封开口; 至少部分地设置在所述门的上表面和所述壳体的相应表面之间的可压缩密封构件，用于通过在所述门处于关闭位置时沿着基本上垂直于所述壁的方向压缩所述可压缩密封构件来形成密封 ; 以及用于限制可压缩密封构件暴露于壳体的处理室侧的环境的机构。

公开(公告)号：US20090120584A1

公开(公告)日：2009-05-14

申请号：US12059820

申请日：2008-03-31

Applicant: Dmitry Lubomirsky ,  Toan Q. Tran ,  Lun Tsuei ,  Manuel A. Hernandez ,  Kirby H. Floyd ,  Ellie Y. Yieh

Inventor： Dmitry Lubomirsky ,  Toan Q. Tran ,  Lun Tsuei ,  Manuel A. Hernandez ,  Kirby H. Floyd ,  Ellie Y. Yieh

IPC: C23F1/08 ,  B05C13/00 ,  B05C15/00 ,  H01L21/677 ,  B05C21/00

CPC classification number: H01L21/6719 ,  H01L21/67017 ,  H01L21/68742 ,  H01L21/68792

Abstract: A semiconductor processing system is described. The system includes a processing chamber having an interior capable of holding an internal chamber pressure below ambient atmospheric pressure. The system also includes a pumping system coupled to the chamber and adapted to remove material from the processing chamber. The system further includes a substrate support pedestal, where the substrate support pedestal is rigidly coupled to a substrate support shaft extending through a wall of the processing chamber. A bracket located outside the processing chamber is provided which is rigidly and sometimes rotatably coupled to the substrate support shaft. A motor coupled to the bracket can be actuated to vertically translate the substrate support pedestal, shaft and bracket from a first position to a second position closer to a processing plate. A piston mounted on an end of the bracket provides a counter-balancing force to a tilting force, where the tilting force is generated by a change in the internal chamber pressure and causes a deflection in the position of the bracket and the substrate support. The counter-balancing force reduces the deflection of the bracket and the substrate support.

Abstract translation: 描述半导体处理系统。 该系统包括具有能够将内部室压力保持在环境大气压力以下的内部的处理室。 该系统还包括耦合到腔室并适于从处理室移除材料的泵送系统。 该系统还包括基板支撑基座，其中基板支撑基座刚性地联接到延伸穿过处理室的壁的基板支撑轴。 提供位于处理室外部的支架，其刚性且有时可旋转地联接到基板支撑轴。 耦合到支架的马达可以被致动以将基板支撑基座，轴和托架从第一位置垂直平移到靠近处理板的第二位置。 安装在支架的端部上的活塞提供与倾斜力的反平衡力，其中倾斜力由内部室压力的变化产生，并且引起支架和基板支撑件的位置的偏转。 反平衡力减小了支架和基板支架的挠曲。

公开(公告)号：US07204888B2

公开(公告)日：2007-04-17

申请号：US10428967

申请日：2003-05-01

Applicant: Toan Q. Tran ,  Daniel S. Herkalo ,  Yen-Kun V. Wang ,  Jin Ho Lee ,  Dong Hyung Lee ,  Jang Seok Oh ,  Won B. Bang

Inventor： Toan Q. Tran ,  Daniel S. Herkalo ,  Yen-Kun V. Wang ,  Jin Ho Lee ,  Dong Hyung Lee ,  Jang Seok Oh ,  Won B. Bang

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01L21/68742

Abstract: Embodiments of the present invention provide an apparatus for constraining and supporting the lift pins to prevent or minimize lateral movement of the lift pins that causes substrate hand-off problems and associated degradation in substrate processing characteristics and results. In one embodiment, a lift pin assembly for manipulating a substrate above a support surface of a substrate support comprises a plurality of lift pins movable between an up position and a down position. The lift pins include top ends and bottom ends. The top ends are configured to be lifted above the support surface of the substrate support to contact a bottom surface of the substrate in the up position. The top ends are configured to be positioned at or below the support surface of the substrate support in the down position. A lift pin connecting member is attached to the plurality of lift pins at attachment locations at or near the bottom ends of the lift pins to maintain fixed relative distances between the lift pins at the attachment locations and to move with the lift pins between the up position and the down position.

Abstract translation: 本发明的实施例提供了一种用于约束和支撑提升销的装置，以防止或最小化提升销的横向移动，这导致基板切换问题以及相关的基板处理特性和结果的退化。 在一个实施例中，用于在衬底支撑件的支撑表面上方操作衬底的提升销组件包括可在上升位置和下降位置之间移动的多个提升销。 提升销包括顶端和底端。 顶端构造成被提升在基板支撑件的支撑表面上方以在上方位置接触基板的底表面。 顶端构造成位于下方位置处的基板支撑件的支撑表面上或下方。 提升销连接构件在提升销的底端处或附近的附接位置处附接到多个提升销，以在附接位置处保持提升销之间的固定的相对距离，并且随着提升销在上部位置之间移动 和下降位置。

公开(公告)号：US20110120017A1

公开(公告)日：2011-05-26

申请号：US12949231

申请日：2010-11-18

Applicant: Won B. Bang ,  Toan Q. Tran ,  Yen-Kun Victor Wang

Inventor： Won B. Bang ,  Toan Q. Tran ,  Yen-Kun Victor Wang

IPC: E05F15/02

CPC classification number: H01L21/67126 ,  E05F15/50 ,  E05F15/56 ,  E05Y2201/458 ,  E05Y2800/12

Abstract: Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door. A valve actuator switch provides a first or second pressure to the actuator depending on the pressure inside a first chamber. In one embodiment, a sensor monitors the pressure inside the first chamber.

Abstract translation: 描述了用于密封半导体处理系统中的两个室之间的开口的门系统的技术。 当门处于关闭位置时，密封构件密封开口。 为了选择性地打开和关闭开口，执行器移动门。 阀致动器开关根据第一室内的压力向致动器提供第一或第二压力。 在一个实施例中，传感器监测第一室内的压力。

公开(公告)号：US20110011338A1

公开(公告)日：2011-01-20

申请号：US12836726

申请日：2010-07-15

Applicant: Kien N. Chuc ,  Qiwei Liang ,  Hanh D. Nguyen ,  Xinglong Chen ,  Matthew Miller ,  Soonam Park ,  Toan Q. Tran ,  Adib Khan ,  Jang-Gyoo Yang ,  Dmitry Lubomirsky ,  Shankar Venkataraman

Inventor： Kien N. Chuc ,  Qiwei Liang ,  Hanh D. Nguyen ,  Xinglong Chen ,  Matthew Miller ,  Soonam Park ,  Toan Q. Tran ,  Adib Khan ,  Jang-Gyoo Yang ,  Dmitry Lubomirsky ,  Shankar Venkataraman

IPC: C23C16/00

CPC classification number: C23C16/45565 ,  C23C16/452 ,  C23C16/45574 ,  H01J37/3244 ,  H01J37/32449 ,  Y10T137/85938

Abstract: Apparatus and methods for gas distribution assemblies are provided. In one aspect, a gas distribution assembly is provided comprising an annular body comprising an annular ring having an inner annular wall, an outer wall, an upper surface, and a bottom surface, an upper recess formed into the upper surface, and a seat formed into the inner annular wall, an upper plate positioned in the upper recess, comprising a disk-shaped body having a plurality of first apertures formed therethrough, and a bottom plate positioned on the seat, comprising a disk-shaped body having a plurality of second apertures formed therethrough which align with the first apertures, and a plurality of third apertures formed between the second apertures and through the bottom plate, the bottom plate sealingly coupled to the upper plate to fluidly isolate the plurality of first and second apertures from the plurality of third apertures.

Abstract translation: 提供了用于气体分配组件的装置和方法。 一方面，提供了一种气体分配组件，包括环形体，该环形体包括具有内环形壁，外壁，上表面和底表面的环形环，形成在上表面中的上凹部，以及形成 位于所述内部环形壁中的位于所述上部凹部中的上板，包括具有穿过其形成的多个第一孔的盘状体和位于所述座上的底板，所述底板包括具有多个第二孔的盘状体 通过其形成的孔与第一孔对准，以及形成在第二孔之间并穿过底板的多个第三孔，底板密封地联接到上板，以将多个第一和第二孔与多个 第三孔。

公开(公告)号：US06273140B1

公开(公告)日：2001-08-14

申请号：US09318231

申请日：1999-05-25

Applicant: Toan Q. Tran

Inventor： Toan Q. Tran

IPC: F16K1110

CPC classification number: F16K51/02 ,  F16K27/065 ,  Y10T137/87909 ,  Y10T137/87917

Abstract: A valve assembly comprises a valve body having an interior valve seat and a plurality of adapter ports. A non-metallic sealing material provides a vacuum seal between mating surfaces of adjacent vacuum components, and direct physical contact between mating surfaces ensures good thermal conduction within the valve assembly.

Abstract translation: 阀组件包括具有内阀座和多个适配器端口的阀体。 非金属密封材料在相邻真空部件的配合表面之间提供真空密封，并且配合表面之间的直接物理接触确保阀组件内的良好的热传导。

公开(公告)号：US08894767B2

公开(公告)日：2014-11-25

申请号：US12836726

申请日：2010-07-15

Applicant: Kien N. Chuc ,  Qiwei Liang ,  Hanh D. Nguyen ,  Xinglong Chen ,  Matthew Miller ,  Soonam Park ,  Toan Q. Tran ,  Adib Khan ,  Jang-Gyoo Yang ,  Dmitry Lubomirsky ,  Shankar Venkataraman

Inventor： Kien N. Chuc ,  Qiwei Liang ,  Hanh D. Nguyen ,  Xinglong Chen ,  Matthew Miller ,  Soonam Park ,  Toan Q. Tran ,  Adib Khan ,  Jang-Gyoo Yang ,  Dmitry Lubomirsky ,  Shankar Venkataraman

IPC: C23C16/00 ,  C23F1/00 ,  C23C16/455 ,  H01J37/32 ,  C23C16/452

CPC classification number: C23C16/45565 ,  C23C16/452 ,  C23C16/45574 ,  H01J37/3244 ,  H01J37/32449 ,  Y10T137/85938

Abstract: Apparatus and methods for gas distribution assemblies are provided. In one aspect, a gas distribution assembly is provided comprising an annular body comprising an annular ring having an inner annular wall, an outer wall, an upper surface, and a bottom surface, an upper recess formed into the upper surface, and a seat formed into the inner annular wall, an upper plate positioned in the upper recess, comprising a disk-shaped body having a plurality of first apertures formed therethrough, and a bottom plate positioned on the seat, comprising a disk-shaped body having a plurality of second apertures formed therethrough which align with the first apertures, and a plurality of third apertures formed between the second apertures and through the bottom plate, the bottom plate sealingly coupled to the upper plate to fluidly isolate the plurality of first and second apertures from the plurality of third apertures.

Abstract translation: 提供了用于气体分配组件的装置和方法。 一方面，提供了一种气体分配组件，包括环形体，该环形体包括具有内环形壁，外壁，上表面和底表面的环形环，形成在上表面中的上凹部，以及形成 位于所述内部环形壁中的位于所述上部凹部中的上板，包括具有穿过其形成的多个第一孔的盘状体和位于所述座上的底板，所述底板包括具有多个第二孔的盘状体 通过其形成的孔与第一孔对准，以及形成在第二孔之间并穿过底板的多个第三孔，底板密封地联接到上板，以将多个第一和第二孔与多个 第三孔。

公开(公告)号：US07841582B2

公开(公告)日：2010-11-30

申请号：US10990125

申请日：2004-11-16

Applicant: Won B. Bang ,  Toan Q. Tran ,  Yen-Kun Victor Wang

Inventor： Won B. Bang ,  Toan Q. Tran ,  Yen-Kun Victor Wang

IPC: F16K25/00

CPC classification number: H01L21/67126

Abstract: Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door. A valve actuator switch provides a first or second pressure to the actuator depending on the pressure inside a first chamber. In one embodiment, a sensor monitors the pressure inside the first chamber.

Abstract translation: 描述了用于密封半导体处理系统中的两个室之间的开口的门系统的技术。 当门处于关闭位置时，密封构件密封开口。 为了选择性地打开和关闭开口，致动器移动门。 阀致动器开关根据第一室内的压力向致动器提供第一或第二压力。 在一个实施例中，传感器监测第一室内的压力。

公开(公告)号：US20090000550A1

公开(公告)日：2009-01-01

申请号：US11770737

申请日：2007-06-29

Applicant: Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei

Inventor： Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei

IPC: H01L21/02 ,  F16L25/00 ,  F17D1/02 ,  F28F1/00

CPC classification number: F16L59/184 ,  Y10T137/87571 ,  Y10T137/9029

Abstract: Embodiments of a manifold assembly are provided herein. In some embodiments, a manifold assembly includes a first manifold having a first inlet, for coupling to a high temperature fluid source, and a first outlet; a second manifold having a second inlet and a second outlet; and a connector portion coupling the first outlet of the first manifold to the second inlet of the second manifold, the connector portion includes a polymer block; and a thermal isolator disposed between the polymer block and the first manifold.

Abstract translation: 本文提供了歧管组件的实施例。 在一些实施例中，歧管组件包括具有用于联接到高温流体源的第一入口和第一出口的第一歧管; 具有第二入口和第二出口的第二歧管; 以及将第一歧管的第一出口连接到第二歧管的第二入口的连接器部分，连接器部分包括聚合物块; 以及设置在聚合物块和第一歧管之间的热隔离器。

公开(公告)号：US20080296304A1

公开(公告)日：2008-12-04

申请号：US11756632

申请日：2007-06-01

Applicant: Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei ,  Won Bang

Inventor： Toan Q. Tran ,  Dimitry Lubormirsky ,  Lun Tsuei ,  Won Bang

IPC: B65D43/00

CPC classification number: H01L21/67126

Abstract: Embodiments of a valve assembly for a process chamber having improved seal performance are provided herein. In some embodiments, a valve assembly for a process chamber includes a housing having an opening disposed in a wall thereof and through which a substrate may be transferred; a door movably coupled to the housing in a plane substantially parallel to the wall of the housing for selectively sealing the opening; a compressible sealing member disposed at least partly between an upper surface of the door and a corresponding surface of the housing for forming a seal therebetween by compression of the compressible sealing member in a direction substantially perpendicular to the wall when the door is in a closed position; and a mechanism for restricting the exposure of the compressible sealing member to an environment on a process chamber side of the housing.

Abstract translation: 本文提供了具有改进的密封性能的用于处理室的阀组件的实施例。 在一些实施例中，用于处理室的阀组件包括壳体，该壳体具有设置在其壁中的开口，并且基板可以通过该开口传送; 门，其基本上平行于壳体的壁可移动地联接到壳体，用于选择性地密封开口; 至少部分地设置在所述门的上表面和所述壳体的相应表面之间的可压缩的密封构件，用于通过当所述门处于关闭位置时在基本上垂直于所述壁的方向上压缩所述可压缩密封构件来形成密封件 ; 以及用于限制可压缩密封构件暴露于壳体的处理室侧的环境的机构。