发明授权
- 专利标题: Particle monitor system and substrate processing apparatus
- 专利标题(中): 粒子监测系统和基板处理装置
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申请号: US11969501申请日: 2008-01-04
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公开(公告)号: US07852476B2公开(公告)日: 2010-12-14
- 发明人: Tsuyoshi Moriya
- 申请人: Tsuyoshi Moriya
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2007-007367 20070116
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
A particle monitor system capable of accurately detecting the number of or the size of particles flowing through an exhaust pipe. In a bypass line through which a chamber is communicated with a dry pump, there is disposed the particle monitor system that includes a laser oscillator for irradiating laser light, a photo multiplier tube having a focal point thereof located at a location where the center axis of the bypass line crosses the laser light, and a particle converging member formed by a circular disk-like member and formed with a through hole facing the focal point FP. A gap is defined between the bypass line and an outer periphery of the particle converging member.
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