发明授权
- 专利标题: Defect inspection method and system
- 专利标题(中): 缺陷检查方法和系统
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申请号: US12366956申请日: 2009-02-06
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公开(公告)号: US07859656B2公开(公告)日: 2010-12-28
- 发明人: Sachio Uto , Hiroyuki Nakano , Yukihiro Shibata , Akira Hamamatsu , Yuta Urano
- 申请人: Sachio Uto , Hiroyuki Nakano , Yukihiro Shibata , Akira Hamamatsu , Yuta Urano
- 申请人地址: JP Tokyo
- 专利权人: Hitachi high-Technologies Corporation
- 当前专利权人: Hitachi high-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2006-054289 20060301
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; G01N21/88 ; H01L27/00
摘要:
An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably.
公开/授权文献
- US20090141269A1 Defect Inspection Method And System 公开/授权日:2009-06-04
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