发明授权
US07868308B2 Electron beam writing method, fine pattern writing system, and manufacturing method of uneven pattern carrying substrate 失效
电子束写入方法,精细图案写入系统以及不均匀图案承载衬底的制造方法

  • 专利标题: Electron beam writing method, fine pattern writing system, and manufacturing method of uneven pattern carrying substrate
  • 专利标题(中): 电子束写入方法,精细图案写入系统以及不均匀图案承载衬底的制造方法
  • 申请号: US12359418
    申请日: 2009-01-26
  • 公开(公告)号: US07868308B2
    公开(公告)日: 2011-01-11
  • 发明人: Kazunori KomatsuToshinori Usa
  • 申请人: Kazunori KomatsuToshinori Usa
  • 申请人地址: JP Tokyo
  • 专利权人: Fujifilm Corporation
  • 当前专利权人: Fujifilm Corporation
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Young & Thompson
  • 优先权: JP2008-013532 20080124
  • 主分类号: G21K5/10
  • IPC分类号: G21K5/10 H01J37/08
Electron beam writing method, fine pattern writing system, and manufacturing method of uneven pattern carrying substrate
摘要:
A fine pattern which includes servo patterns, each constituted by servo elements, and groove patterns, each for separating adjacent data tracks, is formed on a substrate applied with a resist and placed on a rotation stage by scanning an electron beam on the substrate. While rotating the substrate in one direction, the electron beam is scanned so as to completely fill servo elements corresponding to a plurality of tracks one by one during one rotation of the substrate by X-Y deflecting the electron beam and vibrating back and forth in the radius direction. Each groove pattern is set as a line-up of a plurality of groove elements divided at a predetermined angle, and groove elements corresponding to the plurality of tracks following the writing of the servo elements are sequentially written by deflection scanning the electron beam largely in a circumferential direction during the same rotation.
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