发明授权
US07871211B2 Coating and developing system, coating and developing method and storage medium
有权
涂层和显影系统,涂层和显影方法和存储介质
- 专利标题: Coating and developing system, coating and developing method and storage medium
- 专利标题(中): 涂层和显影系统,涂层和显影方法和存储介质
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申请号: US12058252申请日: 2008-03-28
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公开(公告)号: US07871211B2公开(公告)日: 2011-01-18
- 发明人: Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
- 申请人: Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2007-095742 20070330
- 主分类号: G03D5/00
- IPC分类号: G03D5/00 ; G03B27/52 ; B05C11/02 ; G03F1/00
摘要:
A coating and developing system has a first processing block, a second processing block, and a transfer block interposed between the first and the second processing block. A first direct carrying means carries substrates from a carrier block to the transfer block. The transfer block distributes the substrates to respective film forming unit blocks of the first and the second processing block. Substrates on which films have been formed by the first and the second processing block are collected temporarily in the transfer block. A second direct carrying means carries the substrate collected in the transfer block from the transfer block to an interface block. Use of the first and the second processing block can improve the throughput of the coating and developing system. Since a carrying route from the carrier block to the first processing block, and a carrying route from the carrier block to the second processing block are the same, a carrying program is easy to create.
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